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Title: Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy

Abstract

This article reports on the comparison of beryllium oxide and pyrolytic graphite as crucible liners in a high-temperature effusion cell used for boron doping in silicon grown by molecular beam epitaxy. Secondary ion mass spectroscopy analysis indicates decomposition of the beryllium oxide liner, leading to significant incorporation of beryllium and oxygen in the grown films. The resulting films are of poor crystal quality with rough surfaces and broad x-ray diffraction peaks. Alternatively, the use of pyrolytic graphite crucible liners results in higher quality films.

Authors:
;  [1]
  1. Laboratory for Physical Sciences, University of Maryland, College Park, Maryland 20740 (United States)
Publication Date:
OSTI Identifier:
22099116
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 30; Journal Issue: 6; Other Information: (c) 2012 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; BERYLLIUM; BERYLLIUM OXIDES; BORON; COMPARATIVE EVALUATIONS; CRUCIBLES; CRYSTAL GROWTH; DIFFUSION; DOPED MATERIALS; ION MICROPROBE ANALYSIS; IONS; MASS SPECTROSCOPY; MOLECULAR BEAM EPITAXY; OXYGEN; PYROLYTIC CARBON; ROUGHNESS; SILICON; TEMPERATURE RANGE 0400-1000 K; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Ali, Dyan, and Richardson, Christopher J. K. Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy. United States: N. p., 2012. Web. doi:10.1116/1.4764509.
Ali, Dyan, & Richardson, Christopher J. K. Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy. United States. doi:10.1116/1.4764509.
Ali, Dyan, and Richardson, Christopher J. K. Thu . "Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy". United States. doi:10.1116/1.4764509.
@article{osti_22099116,
title = {Comparison of beryllium oxide and pyrolytic graphite crucibles for boron doped silicon epitaxy},
author = {Ali, Dyan and Richardson, Christopher J. K.},
abstractNote = {This article reports on the comparison of beryllium oxide and pyrolytic graphite as crucible liners in a high-temperature effusion cell used for boron doping in silicon grown by molecular beam epitaxy. Secondary ion mass spectroscopy analysis indicates decomposition of the beryllium oxide liner, leading to significant incorporation of beryllium and oxygen in the grown films. The resulting films are of poor crystal quality with rough surfaces and broad x-ray diffraction peaks. Alternatively, the use of pyrolytic graphite crucible liners results in higher quality films.},
doi = {10.1116/1.4764509},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 6,
volume = 30,
place = {United States},
year = {2012},
month = {11}
}