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Title: Oxidation behavior of arc evaporated Al-Cr-Si-N thin films

Abstract

The impact of Al and Si on the oxidation behavior of Al-Cr-(Si)-N thin films synthesized by arc evaporation of powder metallurgically prepared Al{sub x}Cr{sub 1-x} targets with x = Al/(Al + Cr) of 0.5, 0.6, and 0.7 and (Al{sub 0.5}Cr{sub 0.5}){sub 1-z}Si{sub z} targets with Si contents of z = 0.05, 0.1, and 0.2 in N{sub 2} atmosphere was studied in detail by means of differential scanning calorimetry, thermogravimetric analysis (TGA), x-ray diffraction, and Raman spectroscopy. Dynamical measurements in synthetic air (up to 1440 Degree-Sign C) revealed the highest onset temperature of pronounced oxidation for nitride coatings prepared from the Al{sub 0.4}Cr{sub 0.4}Si{sub 0.2} target. Isothermal TGA at 1100, 1200, 1250, and 1300 Degree-Sign C highlight the pronounced improvement of the oxidation resistance of Al{sub x}Cr{sub 1-x}N coatings by the addition of Si. The results show that Si promotes the formation of a dense coating morphology as well as a dense oxide scale when exposed to air.

Authors:
; ; ; ; ;  [1];  [2];  [3];  [4]
  1. Christian Doppler Laboratory for Advanced Hard Coatings, Department of Physical Metallurgy and Materials Testing, Montanuniversitaet Leoben, Franz-Josef-Strasse 18, A-8700 Leoben (Austria)
  2. (Austria)
  3. (Liechtenstein)
  4. (Germany)
Publication Date:
OSTI Identifier:
22099110
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 30; Journal Issue: 6; Other Information: (c) 2012 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; AIR; ALUMINIUM; ALUMINIUM COMPOUNDS; CALORIMETRY; CHROMIUM COMPOUNDS; CONTROLLED ATMOSPHERES; MORPHOLOGY; NITROGEN; OXIDATION; POWDER METALLURGY; PROTECTIVE COATINGS; RAMAN SPECTROSCOPY; SILICON; SILICON COMPOUNDS; THERMAL GRAVIMETRIC ANALYSIS; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Tritremmel, Christian, Daniel, Rostislav, Mitterer, Christian, Mayrhofer, Paul H., Lechthaler, Markus, Polcik, Peter, Christian Doppler Laboratory for Application Oriented Coating Development, Department of Physical Metallurgy and Materials Testing, Montanuniversitaet Leoben, Franz-Josef-Strasse 18, A-8700 Leoben, OC Oerlikon Balzers AG, Iramali 18, LI-9496 Balzers, and PLANSEE Composite Materials GmbH, Siebenbuergerstrasse 23, D-86983 Lechbruck am See. Oxidation behavior of arc evaporated Al-Cr-Si-N thin films. United States: N. p., 2012. Web. doi:10.1116/1.4748802.
Tritremmel, Christian, Daniel, Rostislav, Mitterer, Christian, Mayrhofer, Paul H., Lechthaler, Markus, Polcik, Peter, Christian Doppler Laboratory for Application Oriented Coating Development, Department of Physical Metallurgy and Materials Testing, Montanuniversitaet Leoben, Franz-Josef-Strasse 18, A-8700 Leoben, OC Oerlikon Balzers AG, Iramali 18, LI-9496 Balzers, & PLANSEE Composite Materials GmbH, Siebenbuergerstrasse 23, D-86983 Lechbruck am See. Oxidation behavior of arc evaporated Al-Cr-Si-N thin films. United States. doi:10.1116/1.4748802.
Tritremmel, Christian, Daniel, Rostislav, Mitterer, Christian, Mayrhofer, Paul H., Lechthaler, Markus, Polcik, Peter, Christian Doppler Laboratory for Application Oriented Coating Development, Department of Physical Metallurgy and Materials Testing, Montanuniversitaet Leoben, Franz-Josef-Strasse 18, A-8700 Leoben, OC Oerlikon Balzers AG, Iramali 18, LI-9496 Balzers, and PLANSEE Composite Materials GmbH, Siebenbuergerstrasse 23, D-86983 Lechbruck am See. Thu . "Oxidation behavior of arc evaporated Al-Cr-Si-N thin films". United States. doi:10.1116/1.4748802.
@article{osti_22099110,
title = {Oxidation behavior of arc evaporated Al-Cr-Si-N thin films},
author = {Tritremmel, Christian and Daniel, Rostislav and Mitterer, Christian and Mayrhofer, Paul H. and Lechthaler, Markus and Polcik, Peter and Christian Doppler Laboratory for Application Oriented Coating Development, Department of Physical Metallurgy and Materials Testing, Montanuniversitaet Leoben, Franz-Josef-Strasse 18, A-8700 Leoben and OC Oerlikon Balzers AG, Iramali 18, LI-9496 Balzers and PLANSEE Composite Materials GmbH, Siebenbuergerstrasse 23, D-86983 Lechbruck am See},
abstractNote = {The impact of Al and Si on the oxidation behavior of Al-Cr-(Si)-N thin films synthesized by arc evaporation of powder metallurgically prepared Al{sub x}Cr{sub 1-x} targets with x = Al/(Al + Cr) of 0.5, 0.6, and 0.7 and (Al{sub 0.5}Cr{sub 0.5}){sub 1-z}Si{sub z} targets with Si contents of z = 0.05, 0.1, and 0.2 in N{sub 2} atmosphere was studied in detail by means of differential scanning calorimetry, thermogravimetric analysis (TGA), x-ray diffraction, and Raman spectroscopy. Dynamical measurements in synthetic air (up to 1440 Degree-Sign C) revealed the highest onset temperature of pronounced oxidation for nitride coatings prepared from the Al{sub 0.4}Cr{sub 0.4}Si{sub 0.2} target. Isothermal TGA at 1100, 1200, 1250, and 1300 Degree-Sign C highlight the pronounced improvement of the oxidation resistance of Al{sub x}Cr{sub 1-x}N coatings by the addition of Si. The results show that Si promotes the formation of a dense coating morphology as well as a dense oxide scale when exposed to air.},
doi = {10.1116/1.4748802},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
issn = {0734-2101},
number = 6,
volume = 30,
place = {United States},
year = {2012},
month = {11}
}