Integration of a broad beam ion source with a high-temperature x-ray diffraction vacuum chamber
- Leibniz-Institut fuer Oberflaechenmodifizierung e. V., Permoserstr. 15, 04318 Leipzig (Germany)
Here, the integration of a low energy, linearly variable ion beam current density, mechanically in situ adjustable broad beam ion source with a high-temperature x-ray diffraction (XRD) vacuum chamber is reported. This allows in situ XRD investigation of phase formation and evolution processes induced by low energy ion implantation. Special care has been taken to an independent adjustment of the ion beam for geometrical directing towards the substrate, a 15 mm small ion source exit aperture to avoid a secondary sputter process of the chamber walls, linearly variable ion current density by using a pulse length modulation (PLM) for the accelerating voltages without changing the ion beam density profile, nearly homogeneous ion beam distribution over the x-ray footprint, together with easily replaceable Kapton{sup Registered-Sign} windows for x-rays entry and exit. By combining a position sensitive x-ray detector with this PLM-modulated ion beam, a fast and efficient time resolved investigation of low energy implantation processes is obtained in a compact experimental setup.
- OSTI ID:
- 22093988
- Journal Information:
- Review of Scientific Instruments, Vol. 83, Issue 11; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0034-6748
- Country of Publication:
- United States
- Language:
- English
Similar Records
Development of high productivity medium current ion implanter 'EXCEED 3000AH Evo2'
Chamber Clearing First Principles Modeling