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Title: Effect of capacitive coupling in a miniature inductively coupled plasma source

Abstract

Two-dimensional axisymmetric particle-in-cell simulations with a Monte Carlo collision algorithm (PIC-MCC) have been conducted to investigate the effect of capacitive coupling in a miniature inductively coupled plasma source (mICP) by using two models: an inductive model and a hybrid model. The mICP is 3 mm in radius and 6 mm in height with a three-turn planar coil, where argon plasma is sustained. In the inductive model, the coil is assumed to be electrostatically shielded, and thus the discharge is purely inductive coupling. In the hybrid model, we assume that the different turns of the coil act like electrodes in capacitive discharge to include the effect of capacitive coupling. The voltage applied to these electrodes decreases linearly from the powered end of the coil towards the grounded end. The numerical analysis has been performed for rf frequencies in the range of 100-1000 MHz, and the power absorbed by the plasma in the range of 5-50 mW at a fixed pressure of 500 mTorr. The PIC-MCC results show that potential oscillations at the plasma-dielectric interface are not negligible, and thus the major component of the absorbed power is caused by the axial motion of electrons in the hybrid model, although almost allmore » of the power absorption is due to the azimuthal motion of electrons in the inductive model. The effect of capacitive coupling is more significant at lower rf frequencies and at higher absorbed powers under the calculation conditions examined. Moreover, much less coil currents are required in the hybrid model.« less

Authors:
; ;  [1]
  1. Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University, Yoshida-Honmachi, Sakyo-ku, Kyoto 606-8501 (Japan)
Publication Date:
OSTI Identifier:
22089560
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 112; Journal Issue: 9; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION; ALGORITHMS; ARGON; AXIAL SYMMETRY; COUPLING; DIELECTRIC MATERIALS; ELECTRONS; HIGH-FREQUENCY DISCHARGES; INTERFACES; MONTE CARLO METHOD; NUMERICAL ANALYSIS; OSCILLATIONS; PLASMA; PLASMA SIMULATION; PLASMA WAVES

Citation Formats

Takao, Yoshinori, Eriguchi, Koji, and Ono, Kouichi. Effect of capacitive coupling in a miniature inductively coupled plasma source. United States: N. p., 2012. Web. doi:10.1063/1.4764333.
Takao, Yoshinori, Eriguchi, Koji, & Ono, Kouichi. Effect of capacitive coupling in a miniature inductively coupled plasma source. United States. doi:10.1063/1.4764333.
Takao, Yoshinori, Eriguchi, Koji, and Ono, Kouichi. Thu . "Effect of capacitive coupling in a miniature inductively coupled plasma source". United States. doi:10.1063/1.4764333.
@article{osti_22089560,
title = {Effect of capacitive coupling in a miniature inductively coupled plasma source},
author = {Takao, Yoshinori and Eriguchi, Koji and Ono, Kouichi},
abstractNote = {Two-dimensional axisymmetric particle-in-cell simulations with a Monte Carlo collision algorithm (PIC-MCC) have been conducted to investigate the effect of capacitive coupling in a miniature inductively coupled plasma source (mICP) by using two models: an inductive model and a hybrid model. The mICP is 3 mm in radius and 6 mm in height with a three-turn planar coil, where argon plasma is sustained. In the inductive model, the coil is assumed to be electrostatically shielded, and thus the discharge is purely inductive coupling. In the hybrid model, we assume that the different turns of the coil act like electrodes in capacitive discharge to include the effect of capacitive coupling. The voltage applied to these electrodes decreases linearly from the powered end of the coil towards the grounded end. The numerical analysis has been performed for rf frequencies in the range of 100-1000 MHz, and the power absorbed by the plasma in the range of 5-50 mW at a fixed pressure of 500 mTorr. The PIC-MCC results show that potential oscillations at the plasma-dielectric interface are not negligible, and thus the major component of the absorbed power is caused by the axial motion of electrons in the hybrid model, although almost all of the power absorption is due to the azimuthal motion of electrons in the inductive model. The effect of capacitive coupling is more significant at lower rf frequencies and at higher absorbed powers under the calculation conditions examined. Moreover, much less coil currents are required in the hybrid model.},
doi = {10.1063/1.4764333},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 9,
volume = 112,
place = {United States},
year = {2012},
month = {11}
}