White-light spatial frequency multiplication using soft x-rays
- Lawrence Berkeley National Lab., CA (United States). Center for X-Ray Optics
The authors have patterned a 0.25-micron period grating in SAL-601 photoresist using soft x-ray white-light spatial frequency multiplication. The configuration is that of a grating interferometer using two transmission gratings having the same period ({Lambda} = 0.5 micron) and fabricated by electron beam lithography and lift-off. The first transmission grating splits an incoming x-ray beam into two paths and the second grating, operating in higher order, combines the two beams. A standard wave pattern is obtained at the intersection of the two beams and recorded by a photoresist coated substrate. This patterning technique has the advantage of multiplying the spatial frequency of the interferometer gratings by an even integer factor. Furthermore, the recording geometry is insensitive to both the longitudinal and transverse coherence of the illumination. Synchrotron bending magnet radiation from the Advanced Light Source located at the Lawrence Berkeley National Laboratory was used as the source. The grating interferometer geometry has been used din the past to record white-light interference fringes using visible and ultraviolet light sources. They have used a two-grating interferometer to provide an initial demonstration of white-light spatial frequency doubling at soft x-ray wavelengths. By using this technique with shorter period parent gratings, it should be possible to pattern gratings with higher resolution than electron beam lithography.
- OSTI ID:
- 220797
- Report Number(s):
- CONF-950793-; ISBN 0-8194-1875-7; TRN: IM9620%%191
- Resource Relation:
- Conference: 40. annual meeting of the Society of Photo-Optical Instrumentation Engineers, San Diego, CA (United States), 9-14 Jul 1995; Other Information: PBD: 1995; Related Information: Is Part Of X-ray microbeam technology and applications; Yun, W. [ed.] [Argonne National Lab., IL (United States). Advanced Photon Source]; PB: 249 p.; Proceedings/SPIE, Volume 2516
- Country of Publication:
- United States
- Language:
- English
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