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Title: Introduction of the MC3-II/GP system, medium current ion implanter with enhanced multi-charge beam current

Abstract

The MC3-II/GP is a leading-edge single-wafer medium-current ion implanter, newly developed by SEN Corporation. It demonstrates exceptional productivity based on a high speed wafer-handling station and enhanced beam current. It covers a substantively wider energy range in order to fully meet advanced device requirements. Retaining the superior features of the MC3-II/WR, the MC3-II/GP provides a remarkable increase of multiply-charged beam current coupled with longer ion source lifetime. Another advanced feature of the MC3-II/GP is a 30 second or 14% reduction in auto beam setup time. These improvements enable a fabrication line to reduce the total number of ion implanters and dramatically reduce COO.

Authors:
; ; ; ; ; ; ; ; ; ; ; ; ;  [1]
  1. SEN Corporation, 1501, Imazaike, Saijo, Ehime, 799-1362 (Japan)
Publication Date:
OSTI Identifier:
22075716
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1496; Journal Issue: 1; Conference: 19. international conference on ion implantation technology, Valladolid (Spain), 25-29 Jun 2012; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM CURRENTS; BEAM EXTRACTION; BEAM PRODUCTION; BEAM TRANSPORT; COBALT OXIDES; ELECTRIC ARCS; FABRICATION; ION BEAMS; ION IMPLANTATION; ION SOURCES; LIFETIME; PLASMA; PLASMA DENSITY; PRODUCTIVITY

Citation Formats

Koike, Masazumi, Sato, Fumiaki, Sano, Makoto, Kawatsu, Sho, Kariya, Hiroyuki, Kimura, Yasuhiko, Kudo, Tetsuya, Shiraishi, Miyuki, Shinozuka, Masamitsu, Takahashi, Yuji, Ishida, Yuji, Tsukihara, Mitsukuni, Ueno, Kazuyoshi, and Sugitani, Michiro. Introduction of the MC3-II/GP system, medium current ion implanter with enhanced multi-charge beam current. United States: N. p., 2012. Web. doi:10.1063/1.4766557.
Koike, Masazumi, Sato, Fumiaki, Sano, Makoto, Kawatsu, Sho, Kariya, Hiroyuki, Kimura, Yasuhiko, Kudo, Tetsuya, Shiraishi, Miyuki, Shinozuka, Masamitsu, Takahashi, Yuji, Ishida, Yuji, Tsukihara, Mitsukuni, Ueno, Kazuyoshi, & Sugitani, Michiro. Introduction of the MC3-II/GP system, medium current ion implanter with enhanced multi-charge beam current. United States. doi:10.1063/1.4766557.
Koike, Masazumi, Sato, Fumiaki, Sano, Makoto, Kawatsu, Sho, Kariya, Hiroyuki, Kimura, Yasuhiko, Kudo, Tetsuya, Shiraishi, Miyuki, Shinozuka, Masamitsu, Takahashi, Yuji, Ishida, Yuji, Tsukihara, Mitsukuni, Ueno, Kazuyoshi, and Sugitani, Michiro. Tue . "Introduction of the MC3-II/GP system, medium current ion implanter with enhanced multi-charge beam current". United States. doi:10.1063/1.4766557.
@article{osti_22075716,
title = {Introduction of the MC3-II/GP system, medium current ion implanter with enhanced multi-charge beam current},
author = {Koike, Masazumi and Sato, Fumiaki and Sano, Makoto and Kawatsu, Sho and Kariya, Hiroyuki and Kimura, Yasuhiko and Kudo, Tetsuya and Shiraishi, Miyuki and Shinozuka, Masamitsu and Takahashi, Yuji and Ishida, Yuji and Tsukihara, Mitsukuni and Ueno, Kazuyoshi and Sugitani, Michiro},
abstractNote = {The MC3-II/GP is a leading-edge single-wafer medium-current ion implanter, newly developed by SEN Corporation. It demonstrates exceptional productivity based on a high speed wafer-handling station and enhanced beam current. It covers a substantively wider energy range in order to fully meet advanced device requirements. Retaining the superior features of the MC3-II/WR, the MC3-II/GP provides a remarkable increase of multiply-charged beam current coupled with longer ion source lifetime. Another advanced feature of the MC3-II/GP is a 30 second or 14% reduction in auto beam setup time. These improvements enable a fabrication line to reduce the total number of ion implanters and dramatically reduce COO.},
doi = {10.1063/1.4766557},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1496,
place = {United States},
year = {2012},
month = {11}
}