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Title: Multi-cusp ion source for Gen 5.5 doping system

Abstract

A multi-cusp ion source was designed for Nissin ion doping system 'iG5' developed for GEN5.5 processes. It has many points of similarity to iG4 ion source. The extraction area and the internal volume of the plasma chamber are scaled up. And the method to obtain high current B{sup +} beams is same as iG4 ion source. On the other hand, iG5 ion source has an added feature on the extraction system. We use new developed multi-slit extraction system to obtain stable beams with small divergence. The target boron beam current density of 1mA/cm (that is 130mA) was obtained.

Authors:
; ; ; ; ; ; ; ; ;  [1]
  1. Nissin Ion Equipment Co., Ltd., 29 Hinokigaoka, Minakuchi-cho, Koka, Shiga, 528-0068 (Japan)
Publication Date:
OSTI Identifier:
22075715
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1496; Journal Issue: 1; Conference: 19. international conference on ion implantation technology, Valladolid (Spain), 25-29 Jun 2012; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; 36 MATERIALS SCIENCE; BEAM CURRENTS; BEAM EXTRACTION; BEAM TRANSPORT; BORON; BORON IONS; CURRENT DENSITY; CUSPED GEOMETRIES; ION BEAMS; ION IMPLANTATION; ION SOURCES; PLASMA; STABILITY

Citation Formats

Inouchi, Yutaka, Matsumoto, Takeshi, Dohi, Shojiro, Tanii, Masahiro, Takahashi, Genki, Imai, Katsuharu, Nishimura, Ippei, Tatemichi, Junichi, Konishi, Masashi, and Naito, Masao. Multi-cusp ion source for Gen 5.5 doping system. United States: N. p., 2012. Web. doi:10.1063/1.4766555.
Inouchi, Yutaka, Matsumoto, Takeshi, Dohi, Shojiro, Tanii, Masahiro, Takahashi, Genki, Imai, Katsuharu, Nishimura, Ippei, Tatemichi, Junichi, Konishi, Masashi, & Naito, Masao. Multi-cusp ion source for Gen 5.5 doping system. United States. doi:10.1063/1.4766555.
Inouchi, Yutaka, Matsumoto, Takeshi, Dohi, Shojiro, Tanii, Masahiro, Takahashi, Genki, Imai, Katsuharu, Nishimura, Ippei, Tatemichi, Junichi, Konishi, Masashi, and Naito, Masao. Tue . "Multi-cusp ion source for Gen 5.5 doping system". United States. doi:10.1063/1.4766555.
@article{osti_22075715,
title = {Multi-cusp ion source for Gen 5.5 doping system},
author = {Inouchi, Yutaka and Matsumoto, Takeshi and Dohi, Shojiro and Tanii, Masahiro and Takahashi, Genki and Imai, Katsuharu and Nishimura, Ippei and Tatemichi, Junichi and Konishi, Masashi and Naito, Masao},
abstractNote = {A multi-cusp ion source was designed for Nissin ion doping system 'iG5' developed for GEN5.5 processes. It has many points of similarity to iG4 ion source. The extraction area and the internal volume of the plasma chamber are scaled up. And the method to obtain high current B{sup +} beams is same as iG4 ion source. On the other hand, iG5 ion source has an added feature on the extraction system. We use new developed multi-slit extraction system to obtain stable beams with small divergence. The target boron beam current density of 1mA/cm (that is 130mA) was obtained.},
doi = {10.1063/1.4766555},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1496,
place = {United States},
year = {2012},
month = {11}
}