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Title: Metal etching with reactive gas cluster ion beams using pickup cell

Abstract

Mixed gas cluster ion beams were formed using pickup cell for metal etching. O{sub 2} neutral clusters pick up acetic acid and formed mixed cluster beam. By using O{sub 2}-GCIB with acetic acid, enhancement of Cu etching was observed. Because of dense energy deposition by GCIB, etching of Cu proceeds by CuO formation, enhancement of chemical reaction with acetic acid and desorption of etching products. Surface roughening was not observed on poly crystalline Cu because of the small dependence of etching rate on crystal orientation. Halogen free and low-temperature metal etching with GCIB using pickup cell is possible.

Authors:
;  [1]
  1. Graduate School of Engineering, University of Hyogo, 2167 Shosha, Himeij, Hyogo, 671-2280 (Japan)
Publication Date:
OSTI Identifier:
22075712
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1496; Journal Issue: 1; Conference: 19. international conference on ion implantation technology, Valladolid (Spain), 25-29 Jun 2012; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; ACETIC ACID; CHEMICAL REACTIONS; CLUSTER BEAMS; COPPER; COPPER OXIDES; CRYSTALS; DESORPTION; ETCHING; HALOGENS; ION BEAMS; ION PAIRS; MORPHOLOGY; ROUGHNESS; SURFACES; X-RAY PHOTOELECTRON SPECTROSCOPY

Citation Formats

Toyoda, Noriaki, and Yamada, Isao. Metal etching with reactive gas cluster ion beams using pickup cell. United States: N. p., 2012. Web. doi:10.1063/1.4766545.
Toyoda, Noriaki, & Yamada, Isao. Metal etching with reactive gas cluster ion beams using pickup cell. United States. doi:10.1063/1.4766545.
Toyoda, Noriaki, and Yamada, Isao. Tue . "Metal etching with reactive gas cluster ion beams using pickup cell". United States. doi:10.1063/1.4766545.
@article{osti_22075712,
title = {Metal etching with reactive gas cluster ion beams using pickup cell},
author = {Toyoda, Noriaki and Yamada, Isao},
abstractNote = {Mixed gas cluster ion beams were formed using pickup cell for metal etching. O{sub 2} neutral clusters pick up acetic acid and formed mixed cluster beam. By using O{sub 2}-GCIB with acetic acid, enhancement of Cu etching was observed. Because of dense energy deposition by GCIB, etching of Cu proceeds by CuO formation, enhancement of chemical reaction with acetic acid and desorption of etching products. Surface roughening was not observed on poly crystalline Cu because of the small dependence of etching rate on crystal orientation. Halogen free and low-temperature metal etching with GCIB using pickup cell is possible.},
doi = {10.1063/1.4766545},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1496,
place = {United States},
year = {2012},
month = {11}
}