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Title: Magnetron sputtering system for fabrication of X-ray multilayer optics

Abstract

A specially designed DC/RF magnetron sputtering system has been installed for the development of large area x-ray multilayer (ML) optics at Indus synchrotron radiation facility. A brief description of the system configuration, automation and operating conditions are presented. The system has the capability of fabricating large area (300 Multiplication-Sign 100-mm{sup 2}) X-ray MLs with required accuracy, uniformity and reproducibility. Thin film growth suitable for fabrication of X-ray ML optics has achieved by optimizing the sputtering process parameters. The representative results are presented.

Authors:
; ;  [1]
  1. X-ray Optics Section, Indus Synchrotrons Utilization Division, Raja Ramanna Centre For Advanced Technology, Indore-452013 (India)
Publication Date:
OSTI Identifier:
22068988
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1451; Journal Issue: 1; Conference: Indian Vacuum Society symposium on thin films, Mumbai (India), 9-12 Nov 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 43 PARTICLE ACCELERATORS; BEAM OPTICS; CRYSTAL GROWTH; FABRICATION; LAYERS; OPTIMIZATION; SPUTTERING; SYNCHROTRON RADIATION; THIN FILMS; X RADIATION

Citation Formats

Nayak, M., Rao, P. N., and Lodha, G. S. Magnetron sputtering system for fabrication of X-ray multilayer optics. United States: N. p., 2012. Web. doi:10.1063/1.4732398.
Nayak, M., Rao, P. N., & Lodha, G. S. Magnetron sputtering system for fabrication of X-ray multilayer optics. United States. doi:10.1063/1.4732398.
Nayak, M., Rao, P. N., and Lodha, G. S. Mon . "Magnetron sputtering system for fabrication of X-ray multilayer optics". United States. doi:10.1063/1.4732398.
@article{osti_22068988,
title = {Magnetron sputtering system for fabrication of X-ray multilayer optics},
author = {Nayak, M. and Rao, P. N. and Lodha, G. S.},
abstractNote = {A specially designed DC/RF magnetron sputtering system has been installed for the development of large area x-ray multilayer (ML) optics at Indus synchrotron radiation facility. A brief description of the system configuration, automation and operating conditions are presented. The system has the capability of fabricating large area (300 Multiplication-Sign 100-mm{sup 2}) X-ray MLs with required accuracy, uniformity and reproducibility. Thin film growth suitable for fabrication of X-ray ML optics has achieved by optimizing the sputtering process parameters. The representative results are presented.},
doi = {10.1063/1.4732398},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1451,
place = {United States},
year = {2012},
month = {6}
}