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Title: Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment

Abstract

Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.

Authors:
; ;  [1];  [2]
  1. Department of Physics and Astronomy, Rutgers, State University of New Jersey, 136 Frelinghuysen Road, Piscataway, New Jersey 08854 (United States)
  2. (United States)
Publication Date:
OSTI Identifier:
22054107
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Additional Journal Information:
Journal Volume: 29; Journal Issue: 4; Other Information: (c) 2011 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1553-1813
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BARIUM; CALCIUM; COLLIMATORS; GETTERING; MOLECULAR BEAM EPITAXY; OXIDATION; OXIDES; OXYGEN; PARTIAL PRESSURE; PRESSURE RANGE MICRO PA; PUMPING; STRONTIUM; TITANIUM

Citation Formats

Kim, Yong-Seung, Bansal, Namrata, Oh, Seongshik, and Department of Electrical and Computer Engineering, Rutgers, State University of New Jersey, 94 Brett Road, Piscataway, New Jersey 08854. Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment. United States: N. p., 2011. Web. doi:10.1116/1.3591384.
Kim, Yong-Seung, Bansal, Namrata, Oh, Seongshik, & Department of Electrical and Computer Engineering, Rutgers, State University of New Jersey, 94 Brett Road, Piscataway, New Jersey 08854. Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment. United States. doi:10.1116/1.3591384.
Kim, Yong-Seung, Bansal, Namrata, Oh, Seongshik, and Department of Electrical and Computer Engineering, Rutgers, State University of New Jersey, 94 Brett Road, Piscataway, New Jersey 08854. Fri . "Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment". United States. doi:10.1116/1.3591384.
@article{osti_22054107,
title = {Simple self-gettering differential-pump for minimizing source oxidation in oxide-MBE environment},
author = {Kim, Yong-Seung and Bansal, Namrata and Oh, Seongshik and Department of Electrical and Computer Engineering, Rutgers, State University of New Jersey, 94 Brett Road, Piscataway, New Jersey 08854},
abstractNote = {Source oxidation of easily oxidizing elements such as Ca, Sr, Ba, and Ti in an oxidizing ambient leads to their flux instability and is one of the biggest problems in the multielemental oxide molecular beam epitaxy technique. Here, the authors report a new scheme that can completely eliminate the source oxidation problem: a self-gettering differential pump using the source itself as the pumping medium. The pump simply comprises a long collimator mounted in front of the source in extended port geometry. With this arrangement, the oxygen partial pressure near the source was easily maintained well below the source oxidation regime, resulting in a stabilized flux, comparable to that of an ultrahigh-vacuum environment. Moreover, this pump has a self-feedback mechanism that allows a stronger pumping effectiveness for more easily oxidizing elements, which is a desired property for eliminating the source oxidation problem.},
doi = {10.1116/1.3591384},
journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
issn = {1553-1813},
number = 4,
volume = 29,
place = {United States},
year = {2011},
month = {7}
}