Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties

doi:https://doi.org/10.1116/1.3117243

Title: Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties

Full Record
Other Related Research

Abstract

Optically transparent (Pb,La)(Zr,Ti)O{sub 3} (PLZT) thin films were sputter-deposited on SrTiO{sub 3}(001) and MgO(001) substrates with a SrRuO{sub 3}(110) bottom electrode. X-ray diffraction analysis showed epitaxial growth of monocrystalline PLZT, with (001) rocking curve full width at half maxima of {approx}0.03 degree sign and {approx}0.3 degree sign for films deposited on SrTiO{sub 3} and MgO, respectively. In-plane epitaxial alignment of the SrRuO{sub 3} and PLZT epilayers was verified from {phi}-scans. It was established from atomic force microscopy measurements that the PLZT surface roughness meets the requirement for optical waveguide applications. Recorded P-E loops for films grown on both substrates showed a remanent polarization of {approx}36 {mu}C/cm{sup 2}. The refractive index of the PLZT layer was estimated from rutile prism coupling measurements at {approx}2.56 for {lambda}=633 nm, consistent with data obtained by spectroscopic ellipsometry. The ferroelectric and optical characteristics of the films, as well as their surface roughness, were not appreciably different for the two substrates. This makes MgO the preferred choice of substrate for optical waveguide devices due to its low refractive index compared to that of SrTiO{sub 3}.

Authors:

Nordseth, Ornulf; Tybell, Thomas; Grepstad, Jostein K; Roeyset, Arne ^[1]

Department of Electronics and Telecommunications, Norwegian University of Science and Technology (NTNU), NO-7491 Trondheim (Norway)

Publication Date:: 2009-05-15

OSTI Identifier:: 22053456

Resource Type:: Journal Article

Journal Name:: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

Additional Journal Information:: Journal Volume: 27; Journal Issue: 3; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1553-1813

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; CRYSTAL STRUCTURE; DEPOSITION; ELLIPSOMETRY; EPITAXY; FERROELECTRIC MATERIALS; LAYERS; MAGNESIUM OXIDES; NEUTRON DIFFRACTION; PLZT; POLARIZATION; REFRACTIVE INDEX; ROUGHNESS; SPUTTERING; STRONTIUM TITANATES; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION

Citation Formats


                    Nordseth, Ornulf, Tybell, Thomas, Grepstad, Jostein K, Roeyset, Arne, and SINTEF Materials and Chemistry, NO-7465 Trondheim. Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties.  United States: N. p., 2009. 
        Web.  doi:10.1116/1.3117243.

Copy to clipboard


                    Nordseth, Ornulf, Tybell, Thomas, Grepstad, Jostein K, Roeyset, Arne, & SINTEF Materials and Chemistry, NO-7465 Trondheim. Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties.  United States.  https://doi.org/10.1116/1.3117243

Copy to clipboard


                    Nordseth, Ornulf, Tybell, Thomas, Grepstad, Jostein K, Roeyset, Arne, and SINTEF Materials and Chemistry, NO-7465 Trondheim. Fri .  
        "Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties".  United States.  https://doi.org/10.1116/1.3117243.

Copy to clipboard


                    
@article{osti_22053456,

  title        = {Sputter-deposited (Pb,La)(Zr,Ti)O{sub 3} thin films: Effect of substrate and optical properties},

  author       = {Nordseth, Ornulf and Tybell, Thomas and Grepstad, Jostein K and Roeyset, Arne and SINTEF Materials and Chemistry, NO-7465 Trondheim},

  abstractNote = {Optically transparent (Pb,La)(Zr,Ti)O{sub 3} (PLZT) thin films were sputter-deposited on SrTiO{sub 3}(001) and MgO(001) substrates with a SrRuO{sub 3}(110) bottom electrode. X-ray diffraction analysis showed epitaxial growth of monocrystalline PLZT, with (001) rocking curve full width at half maxima of {approx}0.03 degree sign and {approx}0.3 degree sign for films deposited on SrTiO{sub 3} and MgO, respectively. In-plane epitaxial alignment of the SrRuO{sub 3} and PLZT epilayers was verified from {phi}-scans. It was established from atomic force microscopy measurements that the PLZT surface roughness meets the requirement for optical waveguide applications. Recorded P-E loops for films grown on both substrates showed a remanent polarization of {approx}36 {mu}C/cm{sup 2}. The refractive index of the PLZT layer was estimated from rutile prism coupling measurements at {approx}2.56 for {lambda}=633 nm, consistent with data obtained by spectroscopic ellipsometry. The ferroelectric and optical characteristics of the films, as well as their surface roughness, were not appreciably different for the two substrates. This makes MgO the preferred choice of substrate for optical waveguide devices due to its low refractive index compared to that of SrTiO{sub 3}.},

  doi          = {10.1116/1.3117243},

  url          = {https://www.osti.gov/biblio/22053456},
  journal      = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},

  issn         = {1553-1813},

  number       = 3,

  volume       = 27,

  place        = {United States},

  year         = {2009},

  month        = {5}

}

Copy to clipboard

Journal Article:

https://doi.org/10.1116/1.3117243

Other availability

Find in Google Scholar

Search WorldCat to find libraries that may hold this journal

Save / Share:

Export Metadata

Save to My Library

Similar records in OSTI.GOV collections:

Single-crystal Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3} thin films prepared by metal-organic chemical vapor deposition: Systematic compositional variation of electronic and optical properties

Journal Article Foster, C M ; Bai, G ; Csencsits, R ; ... - Journal of Applied Physics

Single-crystal thin films of Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3} (PZT) covering the full compositional range (0{le}{ital x}{le}1) were deposited by metal-organic chemical vapor deposition. Epitaxial SrRuO{sub 3}(001) thin films grown on SrTiO{sub 3}(001) substrates by rf-magnetron sputter deposition served as template electrode layers. X-ray diffraction, energy-dispersive x-ray spectroscopy, atomic force microscopy, transmission electron microscopy, and optical waveguiding were used to characterize the crystalline structure, composition, surface morphology, microstructure, refractive index, and film thickness of the deposited films. The PZT films were single crystalline for all compositions exhibiting cube-on-cube growth epitaxy with the substrate and showed very high degrees of crystallinity andmore »« less
https://doi.org/10.1063/1.364239
Epitaxial Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3}/SrRuO{sub 3} (x = 0, 0.35, 0.65) multilayer thin films on SrTiO{sub 3}(100) and MgO(100) prepared by MOCVD and RF sputtering

Technical Report Foster, C M ; Csencsits, R ; Baldo, P M ; ...

Epitaxial SrRuO{sub 3} thin films were deposited on SrTiO{sub 3}(100) and MgO(100) substrates by RF sputtering for use as bottom electrodes and epitaxial buffer layers. On these conductive substrates, epitaxial Pb(Zr{sub x}Ti{sub 1{minus}x})O{sub 3} (PZT; x = 0.35,0.65) and PbTiO{sub 3} (PT; x = 0) thin films were deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), RBS channeling (RBS), transmission electron microscopy (TEM) and optical waveguiding were used to characterize the phase, microstructure, defect structure, refractive index, and film thickness of the deposited films. The PZT and PT films were epitaxial and c-axis oriented. 90{degree} domains, interfacial misfitmore »« less
https://doi.org/10.2172/52818

Full Text Available
Epitaxial Pb(Zr{sub 0.40}Ti{sub 0.60})O{sub 3}/SrRuO{sub 3} and PbTiO{sub 3}/SrRuO{sub 3} multilayer thin films prepared by MOCVD and rf sputtering

Conference Foster, C M ; Csencsits, R ; Baldo, P M

Epitaxial SrRuO{sub 3} thin films were deposited by RF sputtering on SrTiO{sub 3} or MgO substrates for use as underlying electrodes. On these conductive substrates, epitaxial Pb(Zr{sub 0.35}Ti{sub 0.65})O{sub 3} (PZT) and PbTiO{sub 3} (PT) thin films were, deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), RBS channeling (RBS), transmission electron microscopy (TEM) and optical waveguiding were used to characterize phase, microstructure, defect structure, refractive index, and film thickness of the deposited films. The PZT and PT films were epitaxial and c-axis oriented. 90{degree} domains, interfacial misfit dislocations and dislocations and threading dislocations were the primary structural defects,more »« less
Full Text Available
Substrate effects on the structure and optical properties of epitaxial PbTiO{sub 3} thin films prepared by metal-organic chemical vapor deposition

Conference Foster, C M ; Li, Z ; Bai, G R ; ...

Epitaxial PbTiO{sub 3} films were prepared by metal-organic chemical vapor deposition (MOCVD) on MgO(001), SrTiO{sub 3}(001) and LaAlO{sub 3}(001) surfaces. Four-circle X-ray diffraction and optical waveguiding experiments were performed to characterize the deposited films. The films on all three substrates were single-crystal; however, the domain structure of the films was strongly dependent on the substrate material. Films on MgO and LaAIO{sub 3} substrates showed a large amount of 90{degrees} domain structures, whereas, the degree of twinning was greatly suppressed for films on SrTiO{sub 3}. The refractive indices and optical birefringence of the films were measured as a function of wavelengthmore »« less
Full Text Available
Structure and properties of heteroepitaxial Pb(Zr{sub 0.35}Ti{sub 0.65})O{sub 3}/SrRuO{sub 3} multilayer thin films on SrTiO{sub 3}(100) prepared by MOCVD and RF sputtering

Conference Foster, C M ; Csencsits, R ; Bai, G R ; ...

Epitaxial SrRuO{sub 3} thin films were deposited on SrTiO{sub 3}(100) substrates by RF sputtering for use as bottom electrodes and epitaxial buffer layers. On these conductive substrates, epitaxial Pb(Zr{sub 0.35}Ti{sub 0.65})O{sub 3} (PZT) thin films were deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), transmission electron microscopy (TEM) and optical waveguiding were used to characterize the phase, refractive index, and film thickness of the deposited films. The epitaxial PZT films were c-axis oriented and contained {approximately}19.7% volume fraction of 90{degrees} domains. Ferroelectric hysteresis and dielectric measurements of epitaxial PZT ferroelectric capacitor structures formed using sputtered ITO top electrodesmore »« less
Full Text Available

Similar Records