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Title: Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy

Abstract

Measurements of electron temperatures (T{sub e}) and electron energy distribution functions (EEDFs) in a dual frequency capacitively coupled etcher were performed by using trace rare gas optical emission spectroscopy (TRG-OES). The parallel plate etcher was powered by a high frequency (60 MHz) ''source'' top electrode and a low frequency (13.56 MHz) ''substrate'' bottom electrode. T{sub e} first increased with pressure up to {approx}20 mTorr and then decreased at higher pressures. Increasing the bottom rf power resulted in higher electron temperatures. Electron temperatures in 90% CF{sub 4}+10% O{sub 2} plasmas were similar to those in 80% CF{sub 4}+20% O{sub 2} plasmas. EEDF exhibited bi-Maxwellian characteristics with enhanced high energy tail, especially at pressures >20 mTorr.

Authors:
; ; ; ; ;  [1]
  1. Department of Chemical and Biomolecular Engineering, Plasma Processing Laboratory, University of Houston, Houston, Texas 77204-4004 (United States)
Publication Date:
OSTI Identifier:
22051008
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
Additional Journal Information:
Journal Volume: 27; Journal Issue: 5; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1553-1813
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; CARBON TETRAFLUORIDE; DISTRIBUTION FUNCTIONS; ELECTRODES; ELECTRON TEMPERATURE; ELECTRONS; EMISSION SPECTROSCOPY; ENERGY SPECTRA; ION TEMPERATURE; MHZ RANGE; OXYGEN; PLASMA; PLASMA DIAGNOSTICS; PLASMA PRESSURE; RARE GASES

Citation Formats

Zhiying, Chen, Donnelly, Vincent M, Economou, Demetre J, Chen, Lee, Funk, Merritt, Sundararajan, Radha, and Tokyo Electron America, Austin, Texas 78741. Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy. United States: N. p., 2009. Web. doi:10.1116/1.3179162.
Zhiying, Chen, Donnelly, Vincent M, Economou, Demetre J, Chen, Lee, Funk, Merritt, Sundararajan, Radha, & Tokyo Electron America, Austin, Texas 78741. Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy. United States. doi:10.1116/1.3179162.
Zhiying, Chen, Donnelly, Vincent M, Economou, Demetre J, Chen, Lee, Funk, Merritt, Sundararajan, Radha, and Tokyo Electron America, Austin, Texas 78741. Tue . "Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy". United States. doi:10.1116/1.3179162.
@article{osti_22051008,
title = {Measurement of electron temperatures and electron energy distribution functions in dual frequency capacitively coupled CF{sub 4}/O{sub 2} plasmas using trace rare gases optical emission spectroscopy},
author = {Zhiying, Chen and Donnelly, Vincent M and Economou, Demetre J and Chen, Lee and Funk, Merritt and Sundararajan, Radha and Tokyo Electron America, Austin, Texas 78741},
abstractNote = {Measurements of electron temperatures (T{sub e}) and electron energy distribution functions (EEDFs) in a dual frequency capacitively coupled etcher were performed by using trace rare gas optical emission spectroscopy (TRG-OES). The parallel plate etcher was powered by a high frequency (60 MHz) ''source'' top electrode and a low frequency (13.56 MHz) ''substrate'' bottom electrode. T{sub e} first increased with pressure up to {approx}20 mTorr and then decreased at higher pressures. Increasing the bottom rf power resulted in higher electron temperatures. Electron temperatures in 90% CF{sub 4}+10% O{sub 2} plasmas were similar to those in 80% CF{sub 4}+20% O{sub 2} plasmas. EEDF exhibited bi-Maxwellian characteristics with enhanced high energy tail, especially at pressures >20 mTorr.},
doi = {10.1116/1.3179162},
journal = {Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films},
issn = {1553-1813},
number = 5,
volume = 27,
place = {United States},
year = {2009},
month = {9}
}