Electron energy flux control using dual power in side-type inductively coupled plasma

Journal Article · Fri Jul 15 00:00:00 EDT 2011 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.3609826· OSTI ID:22046910

Bang, Jin-Young; Kim, Jin-Yong; Chung, Chin-Wook ^[1]

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1. Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of)

Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.

• OSTI ID: 22046910
• Journal Information: Physics of Plasmas, Vol. 18, Issue 7; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ELECTRONS
IONIZATION
KHZ RANGE
LANGMUIR PROBE
MHZ RANGE
PLASMA
PLASMA DENSITY
PLASMA DIAGNOSTICS
PLASMA POTENTIAL
SPATIAL DISTRIBUTION
VARIATIONS