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Title: Electron energy flux control using dual power in side-type inductively coupled plasma

Abstract

Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.

Authors:
; ;  [1]
  1. Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791 (Korea, Republic of)
Publication Date:
OSTI Identifier:
22046910
Resource Type:
Journal Article
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 18; Journal Issue: 7; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 1070-664X
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ELECTRONS; IONIZATION; KHZ RANGE; LANGMUIR PROBE; MHZ RANGE; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA POTENTIAL; SPATIAL DISTRIBUTION; VARIATIONS

Citation Formats

Bang, Jin-Young, Kim, Jin-Yong, and Chung, Chin-Wook. Electron energy flux control using dual power in side-type inductively coupled plasma. United States: N. p., 2011. Web. doi:10.1063/1.3609826.
Bang, Jin-Young, Kim, Jin-Yong, & Chung, Chin-Wook. Electron energy flux control using dual power in side-type inductively coupled plasma. United States. doi:10.1063/1.3609826.
Bang, Jin-Young, Kim, Jin-Yong, and Chung, Chin-Wook. Fri . "Electron energy flux control using dual power in side-type inductively coupled plasma". United States. doi:10.1063/1.3609826.
@article{osti_22046910,
title = {Electron energy flux control using dual power in side-type inductively coupled plasma},
author = {Bang, Jin-Young and Kim, Jin-Yong and Chung, Chin-Wook},
abstractNote = {Spatial distributions of plasma densities and plasma potentials were measured by the Langmuir probe in the plasma which has eight side sources driven by 400 kHz main power. At low pressure, the energy flux to the chamber from the remote plasma was controlled by 13.56 MHz auxiliary power applied around the center due to the variation of the potential distribution. The energy flux from the side sources toward the chamber led to the synergistic effect on the increase in the center density. The drastic increase in the center density and the decrease in the edge density resulted in the efficient power dissipation for ionization.},
doi = {10.1063/1.3609826},
journal = {Physics of Plasmas},
issn = {1070-664X},
number = 7,
volume = 18,
place = {United States},
year = {2011},
month = {7}
}