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Title: Vertically aligned biaxially textured molybdenum thin films

Abstract

Vertically aligned, biaxially textured molybdenum nanorods were deposited using dc magnetron sputtering with glancing flux incidence (alpha = 85 degrees with respect to the substrate normal) and a two-step substrate-rotation mode. These nanorods were identified with a body-centered cubic crystal structure. The formation of a vertically aligned biaxial texture with a [110] out-of-plane orientation was combined with a [-110] in-plane orientation. The kinetics of the growth process was found to be highly sensitive to an optimum rest time of 35 seconds for the two-step substrate rotation mode. At all other rest times, the nanorods possessed two separate biaxial textures each tilted toward one flux direction. While the in-plane texture for the vertical nanorods maintains maximum flux capture area, inclined Mo nanorods deposited at alpha = 85 degrees without substrate rotation display a [-1-1-4] in-plane texture that does not comply with the maximum flux capture area argument. Finally, an in situ capping film was deposited with normal flux incidence over the biaxially textured vertical nanorods resulting in a thin film over the porous nanorods. This capping film possessed the same biaxial texture as the nanorods and could serve as an effective substrate for the epitaxial growth of other functional materials.

Authors:
 [1];  [2];  [3];  [4]
  1. Department of Materials Science and Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)
  2. Department of Chemical and Biological Engineering, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)
  3. US Army Armament Research, Development and Engineering Center, Benet Labs, Watervliet, New York 12189 (United States)
  4. Department of Physics, Applied Physics and Astronomy, Rensselaer Polytechnic Institute, Troy, New York 12180 (United States)
Publication Date:
OSTI Identifier:
22038713
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 110; Journal Issue: 6; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 77 NANOSCIENCE AND NANOTECHNOLOGY; BCC LATTICES; CAPTURE; CRYSTAL GROWTH; DEPOSITION; EPITAXY; MOLYBDENUM; NANOSTRUCTURES; POROUS MATERIALS; SPUTTERING; SUBSTRATES; TEXTURE; THIN FILMS

Citation Formats

Krishnan, Rahul, Riley, Michael, Lee, Sabrina, and Lu, Toh-Ming. Vertically aligned biaxially textured molybdenum thin films. United States: N. p., 2011. Web. doi:10.1063/1.3638452.
Krishnan, Rahul, Riley, Michael, Lee, Sabrina, & Lu, Toh-Ming. Vertically aligned biaxially textured molybdenum thin films. United States. doi:10.1063/1.3638452.
Krishnan, Rahul, Riley, Michael, Lee, Sabrina, and Lu, Toh-Ming. Thu . "Vertically aligned biaxially textured molybdenum thin films". United States. doi:10.1063/1.3638452.
@article{osti_22038713,
title = {Vertically aligned biaxially textured molybdenum thin films},
author = {Krishnan, Rahul and Riley, Michael and Lee, Sabrina and Lu, Toh-Ming},
abstractNote = {Vertically aligned, biaxially textured molybdenum nanorods were deposited using dc magnetron sputtering with glancing flux incidence (alpha = 85 degrees with respect to the substrate normal) and a two-step substrate-rotation mode. These nanorods were identified with a body-centered cubic crystal structure. The formation of a vertically aligned biaxial texture with a [110] out-of-plane orientation was combined with a [-110] in-plane orientation. The kinetics of the growth process was found to be highly sensitive to an optimum rest time of 35 seconds for the two-step substrate rotation mode. At all other rest times, the nanorods possessed two separate biaxial textures each tilted toward one flux direction. While the in-plane texture for the vertical nanorods maintains maximum flux capture area, inclined Mo nanorods deposited at alpha = 85 degrees without substrate rotation display a [-1-1-4] in-plane texture that does not comply with the maximum flux capture area argument. Finally, an in situ capping film was deposited with normal flux incidence over the biaxially textured vertical nanorods resulting in a thin film over the porous nanorods. This capping film possessed the same biaxial texture as the nanorods and could serve as an effective substrate for the epitaxial growth of other functional materials.},
doi = {10.1063/1.3638452},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 6,
volume = 110,
place = {United States},
year = {2011},
month = {9}
}