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Title: Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications

Abstract

We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong <111> texture, and relatively large roughness associated with the Al crystallites. Fits to EUV reflectance measurements also indicate large interface widths, consistent with the electron microscopy results. SiC/Al multilayers deposited by reactive sputtering with nitrogen comprise Al layers that are nearly amorphous and considerably smoother than films deposited nonreactively, but no improvements in EUV reflectance were obtained.

Authors:
;
Publication Date:
OSTI Identifier:
22036407
Resource Type:
Journal Article
Journal Name:
Applied Optics
Additional Journal Information:
Journal Volume: 48; Journal Issue: 26; Other Information: (c) 2009 Optical Society of America; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6935
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ALUMINIUM; EXTREME ULTRAVIOLET RADIATION; INTERFACES; INTERFERENCE; LAYERS; MAGNETRONS; MONOCHROMATIC RADIATION; OPTICAL PROPERTIES; PERFORMANCE; PERIODICITY; REFLECTIVE COATINGS; ROUGHNESS; SILICON CARBIDES; SPUTTERING; STABILITY; TEXTURE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; X RADIATION

Citation Formats

Windt, David L, and Bellotti, Jeffrey A. Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications. United States: N. p., 2009. Web. doi:10.1364/AO.48.004932.
Windt, David L, & Bellotti, Jeffrey A. Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications. United States. https://doi.org/10.1364/AO.48.004932
Windt, David L, and Bellotti, Jeffrey A. Thu . "Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications". United States. https://doi.org/10.1364/AO.48.004932.
@article{osti_22036407,
title = {Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications},
author = {Windt, David L and Bellotti, Jeffrey A},
abstractNote = {We report on the performance, structure and stability of periodic multilayer films containing silicon carbide (SiC) and aluminum (Al) layers designed for use as reflective coatings in the extreme ultraviolet (EUV). We find that SiC/Al multilayers prepared by magnetron sputtering have low stress, good temporal and thermal stability, and provide good performance in the EUV, particularly for applications requiring a narrow spectral bandpass, such as monochromatic solar imaging. Transmission electron microscopy reveals amorphous SiC layers and polycrystalline Al layers having a strong <111> texture, and relatively large roughness associated with the Al crystallites. Fits to EUV reflectance measurements also indicate large interface widths, consistent with the electron microscopy results. SiC/Al multilayers deposited by reactive sputtering with nitrogen comprise Al layers that are nearly amorphous and considerably smoother than films deposited nonreactively, but no improvements in EUV reflectance were obtained.},
doi = {10.1364/AO.48.004932},
url = {https://www.osti.gov/biblio/22036407}, journal = {Applied Optics},
issn = {0003-6935},
number = 26,
volume = 48,
place = {United States},
year = {2009},
month = {9}
}