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Title: Impact of phase lag on uniformity in pulsed capacitively coupled plasmas

Abstract

Process uniformity of macro-scale parameters such as electron and ion densities is critical during any plasma process. Pulsed operation of multiple frequency capacitively coupled plasmas (CCPs) has been shown to improve profile characteristics of features during plasma etching. In this work, we consider pulsing of both power sources in a dual frequency CCP. The impact of phase lag between the high frequency and low frequency power pulses on plasma uniformity is examined using a two-dimensional computational plasma model. Results for Ar/CF{sub 4} gas mixture indicate that phase lag allows one to control plasma uniformity by modulating the time for which the high or low frequency source is on.

Authors:
; ;  [1]
  1. Applied Materials Inc., 974 E. Arques Avenue, M/S 81517, Sunnyvale, California 94085 (United States)
Publication Date:
OSTI Identifier:
22027670
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 99; Journal Issue: 2; Other Information: (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ARGON; CARBON TETRAFLUORIDE; ELECTRON DENSITY; ELECTRONS; ETCHING; HIGH-FREQUENCY DISCHARGES; ION DENSITY; MIXTURES; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA SIMULATION; PULSES; TWO-DIMENSIONAL CALCULATIONS

Citation Formats

Agarwal, Ankur, Rauf, Shahid, and Collins, Ken. Impact of phase lag on uniformity in pulsed capacitively coupled plasmas. United States: N. p., 2011. Web. doi:10.1063/1.3610466.
Agarwal, Ankur, Rauf, Shahid, & Collins, Ken. Impact of phase lag on uniformity in pulsed capacitively coupled plasmas. United States. doi:10.1063/1.3610466.
Agarwal, Ankur, Rauf, Shahid, and Collins, Ken. Mon . "Impact of phase lag on uniformity in pulsed capacitively coupled plasmas". United States. doi:10.1063/1.3610466.
@article{osti_22027670,
title = {Impact of phase lag on uniformity in pulsed capacitively coupled plasmas},
author = {Agarwal, Ankur and Rauf, Shahid and Collins, Ken},
abstractNote = {Process uniformity of macro-scale parameters such as electron and ion densities is critical during any plasma process. Pulsed operation of multiple frequency capacitively coupled plasmas (CCPs) has been shown to improve profile characteristics of features during plasma etching. In this work, we consider pulsing of both power sources in a dual frequency CCP. The impact of phase lag between the high frequency and low frequency power pulses on plasma uniformity is examined using a two-dimensional computational plasma model. Results for Ar/CF{sub 4} gas mixture indicate that phase lag allows one to control plasma uniformity by modulating the time for which the high or low frequency source is on.},
doi = {10.1063/1.3610466},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 2,
volume = 99,
place = {United States},
year = {2011},
month = {7}
}