skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Improved photoresponsivity of semiconducting BaSi{sub 2} epitaxial films grown on a tunnel junction for thin-film solar cells

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3703585· OSTI ID:22025514
; ; ; ; ; ;  [1];  [2];  [1]
  1. Institute of Applied Physics, University of Tsukuba, 1-1-1 Tennohdai, Tsukuba, Ibaraki 305-8573 (Japan)
  2. Institute for Materials Research, Tohoku University, Sendai, Miyagi 980-8577 (Japan)

The highest photoresponsivity and an internal quantum efficiency exceeding 70% at 1.55 eV were achieved for 400 nm thick undoped n-type BaSi{sub 2} epitaxial layers formed on a n{sup +}-BaSi{sub 2}/p{sup +}-Si tunnel junction (TJ) on Si(111). The diffusion of Sb atoms was effectively suppressed by an intermediate polycrystalline Si layer grown by solid phase epitaxy, located between the TJ and undoped BaSi{sub 2} layers.

OSTI ID:
22025514
Journal Information:
Applied Physics Letters, Vol. 100, Issue 15; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English