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Title: Altering the sulfur content in the propanethiol plasma polymers using the capacitive-to-inductive mode transition in inductively coupled plasma discharge

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3686902· OSTI ID:22025434
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  1. Chimie des Interactions Plasma Surface (ChIPS), CIRMAP, Universite de Mons, 20 Place du Parc, B-7000 Mons (Belgium)

The effect of the transition from capacitive (E) to inductive (H) mode on propanethiol plasma polymer films properties was investigated by optical emission as well as by x-ray photoelectron spectroscopy. The E mode is characterized by low deposition rate and by high sulfur content in the films ({approx}40% vs {approx}20% in H mode). After aging, a strong decrease of sulfur to carbon content (from {approx}0.75 to 0.13), attributed to desorption of unbounded sulfur-based molecules (e.g., H{sub 2}S), is detected at low power in E mode. The importance of the E-H transition for altering the film properties is highlighted.

OSTI ID:
22025434
Journal Information:
Applied Physics Letters, Vol. 100, Issue 7; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English