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Title: Coupling effects in inductive discharges with radio frequency substrate biasing

Abstract

Low pressure inductively coupled plasmas (ICP) operated in neon at 27.12 MHz with capacitive substrate biasing (CCP) at 13.56 MHz are investigated by phase resolved optical emission spectroscopy, voltage, and current measurements. Three coupling mechanisms are found potentially limiting the separate control of ion energy and flux: (i) Sheath heating due to the substrate biasing affects the electron dynamics even at high ratios of ICP to CCP power. At fixed CCP power, (ii) the substrate sheath voltage and (iii) the amplitude as well as frequency of plasma series resonance oscillations of the RF current are affected by the ICP power.

Authors:
; ;
Publication Date:
OSTI Identifier:
22025407
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 100; Journal Issue: 2; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; COUPLING; ELECTRIC POTENTIAL; ELECTRONS; EMISSION SPECTROSCOPY; HIGH-FREQUENCY DISCHARGES; IONS; MHZ RANGE; NEON; PLASMA; PLASMA DIAGNOSTICS; PLASMA HEATING; PLASMA PRESSURE; PLASMA SHEATH; PLASMA WAVES; RADIOWAVE RADIATION; SUBSTRATES

Citation Formats

Schulze, J, Schuengel, E, and Czarnetzki, U. Coupling effects in inductive discharges with radio frequency substrate biasing. United States: N. p., 2012. Web. doi:10.1063/1.3675879.
Schulze, J, Schuengel, E, & Czarnetzki, U. Coupling effects in inductive discharges with radio frequency substrate biasing. United States. doi:10.1063/1.3675879.
Schulze, J, Schuengel, E, and Czarnetzki, U. Mon . "Coupling effects in inductive discharges with radio frequency substrate biasing". United States. doi:10.1063/1.3675879.
@article{osti_22025407,
title = {Coupling effects in inductive discharges with radio frequency substrate biasing},
author = {Schulze, J and Schuengel, E and Czarnetzki, U},
abstractNote = {Low pressure inductively coupled plasmas (ICP) operated in neon at 27.12 MHz with capacitive substrate biasing (CCP) at 13.56 MHz are investigated by phase resolved optical emission spectroscopy, voltage, and current measurements. Three coupling mechanisms are found potentially limiting the separate control of ion energy and flux: (i) Sheath heating due to the substrate biasing affects the electron dynamics even at high ratios of ICP to CCP power. At fixed CCP power, (ii) the substrate sheath voltage and (iii) the amplitude as well as frequency of plasma series resonance oscillations of the RF current are affected by the ICP power.},
doi = {10.1063/1.3675879},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 2,
volume = 100,
place = {United States},
year = {2012},
month = {1}
}