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Title: Effect of ion beam energy on density, roughness and uniformity of Co film deposited using ion beam sputtering system

Abstract

Cobalt (Co) films were prepared, using ion beam sputtering technique. Films were prepared by varying beam voltage from 700 to 1100 V at room temperature. The influence of ion beam energy on the density, surface roughness and thickness uniformity of Co film was investigated. X-ray reflectivity study shows that surface roughness of film decreases with increasing beam energy and lowest surface roughness of 1.3 A was achieved for 1000 V beam voltage at 4 cm{sup 3}/min Ar gas flow. The density of the film was 93% of bulk density of Co. These ultra low roughness films are very promising for studying the magnetic properties of Co films.

Authors:
; ;  [1]
  1. X-ray optics Section, Indus Synchrotron Utilization Division, Raja Ramanna Center for Advanced Technology, Indore-452013 (India)
Publication Date:
OSTI Identifier:
22004136
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1447; Journal Issue: 1; Conference: 56. DAE solid state physics symposium 2011, Kattankulathur, Tamilnadu (India), 19-23 Dec 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; BULK DENSITY; COBALT; DEPOSITION; GAS FLOW; ION BEAMS; IRRADIATION; MAGNETIC PROPERTIES; PHYSICAL RADIATION EFFECTS; REFLECTIVITY; ROUGHNESS; SPUTTERING; SURFACES; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Dhawan, Rajnish, Rai, Sanjay, and Lodha, G. S. Effect of ion beam energy on density, roughness and uniformity of Co film deposited using ion beam sputtering system. United States: N. p., 2012. Web. doi:10.1063/1.4710191.
Dhawan, Rajnish, Rai, Sanjay, & Lodha, G. S. Effect of ion beam energy on density, roughness and uniformity of Co film deposited using ion beam sputtering system. United States. doi:10.1063/1.4710191.
Dhawan, Rajnish, Rai, Sanjay, and Lodha, G. S. Tue . "Effect of ion beam energy on density, roughness and uniformity of Co film deposited using ion beam sputtering system". United States. doi:10.1063/1.4710191.
@article{osti_22004136,
title = {Effect of ion beam energy on density, roughness and uniformity of Co film deposited using ion beam sputtering system},
author = {Dhawan, Rajnish and Rai, Sanjay and Lodha, G. S.},
abstractNote = {Cobalt (Co) films were prepared, using ion beam sputtering technique. Films were prepared by varying beam voltage from 700 to 1100 V at room temperature. The influence of ion beam energy on the density, surface roughness and thickness uniformity of Co film was investigated. X-ray reflectivity study shows that surface roughness of film decreases with increasing beam energy and lowest surface roughness of 1.3 A was achieved for 1000 V beam voltage at 4 cm{sup 3}/min Ar gas flow. The density of the film was 93% of bulk density of Co. These ultra low roughness films are very promising for studying the magnetic properties of Co films.},
doi = {10.1063/1.4710191},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1447,
place = {United States},
year = {2012},
month = {6}
}