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Title: Characterization of Ni/Al multilayer on Si substrate by diffraction and reflectometry techniques

Abstract

An ion beam deposited multilayer film of nominal thickness [Ni(200 Angst )/Al(100 Angst )]x5 on Si substrate has been characterized by X-Ray Diffraction(XRD), X-Ray Reflectivity (XRR) and Polarized neutron reflectivity(PNR). The present paper attempts to identify presence of any intermetallic compounds at the interfaces of the as-deposited sample. Structural parameters obtained from XRR and PNR are close to design values.

Authors:
; ; ;  [1];  [2]
  1. Solid State Physics Division Bhabha Atomic Research Center, Mumbai 400085 (India)
  2. (India)
Publication Date:
OSTI Identifier:
22004129
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1447; Journal Issue: 1; Conference: 56. DAE solid state physics symposium 2011, Kattankulathur, Tamilnadu (India), 19-23 Dec 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; ALUMINIUM IONS; CRYSTAL STRUCTURE; DEPOSITION; INTERFACES; INTERMETALLIC COMPOUNDS; ION BEAMS; LAYERS; NEUTRON DIFFRACTION; NICKEL; REFLECTIVITY; SILICON; SUBSTRATES; THIN FILMS; X-RAY DIFFRACTION

Citation Formats

Swain, Mitali, Basu, Saibal, Bhattacharya, Debarati, Gupta, Mukul, and UGC-DAE-Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017. Characterization of Ni/Al multilayer on Si substrate by diffraction and reflectometry techniques. United States: N. p., 2012. Web. doi:10.1063/1.4710169.
Swain, Mitali, Basu, Saibal, Bhattacharya, Debarati, Gupta, Mukul, & UGC-DAE-Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017. Characterization of Ni/Al multilayer on Si substrate by diffraction and reflectometry techniques. United States. doi:10.1063/1.4710169.
Swain, Mitali, Basu, Saibal, Bhattacharya, Debarati, Gupta, Mukul, and UGC-DAE-Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017. Tue . "Characterization of Ni/Al multilayer on Si substrate by diffraction and reflectometry techniques". United States. doi:10.1063/1.4710169.
@article{osti_22004129,
title = {Characterization of Ni/Al multilayer on Si substrate by diffraction and reflectometry techniques},
author = {Swain, Mitali and Basu, Saibal and Bhattacharya, Debarati and Gupta, Mukul and UGC-DAE-Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017},
abstractNote = {An ion beam deposited multilayer film of nominal thickness [Ni(200 Angst )/Al(100 Angst )]x5 on Si substrate has been characterized by X-Ray Diffraction(XRD), X-Ray Reflectivity (XRR) and Polarized neutron reflectivity(PNR). The present paper attempts to identify presence of any intermetallic compounds at the interfaces of the as-deposited sample. Structural parameters obtained from XRR and PNR are close to design values.},
doi = {10.1063/1.4710169},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1447,
place = {United States},
year = {2012},
month = {6}
}