TSOM Method for Nanoelectronics Dimensional Metrology

Journal Article · Thu Nov 10 00:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3657866· OSTI ID:21612180

Attota, Ravikiran ^[1]

---

1. Nanoscale Metrology Group, Physical Measurement Laboratory, National Institute of Standards and Technology, Gaithersburg, Maryland, 20899-8212 (United States)

Through-focus scanning optical microscopy (TSOM) is a relatively new method that transforms conventional optical microscopes into truly three-dimensional metrology tools for nanoscale to microscale dimensional analysis. TSOM achieves this by acquiring and analyzing a set of optical images collected at various focus positions going through focus (from above-focus to under-focus). The measurement resolution is comparable to what is possible with typical light scatterometry, scanning electron microscopy (SEM) and atomic force microscopy (AFM). TSOM method is able to identify nanometer scale difference, type of the difference and magnitude of the difference between two nano/micro scale targets using a conventional optical microscope with visible wavelength illumination. Numerous industries could benefit from the TSOM method--such as the semiconductor industry, MEMS, NEMS, biotechnology, nanomanufacturing, data storage, and photonics. The method is relatively simple and inexpensive, has a high throughput, provides nanoscale sensitivity for 3D measurements and could enable significant savings and yield improvements in nanometrology and nanomanufacturing. Potential applications are demonstrated using experiments and simulations.

• OSTI ID: 21612180
• Journal Information: AIP Conference Proceedings, Vol. 1395, Issue 1; Conference: Conference on frontiers of characterization and metrology for nanoelectronics 2011, Grenoble (France), 23-26 May 2011; Other Information: DOI: 10.1063/1.3657866; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
ATOMIC FORCE MICROSCOPY
COMPUTERIZED SIMULATION
DIFFRACTION GRATINGS
ELECTROMECHANICS
ILLUMINANCE
IMAGE PROCESSING
IMAGES
MEASURING METHODS
MICROSTRUCTURE
NANOSTRUCTURES
OPTICAL MICROSCOPES
RESOLUTION
SCANNING ELECTRON MICROSCOPY
SCANNING LIGHT MICROSCOPY
SEMICONDUCTOR MATERIALS
SENSITIVITY
THREE-DIMENSIONAL CALCULATIONS
ELECTRON MICROSCOPY
MATERIALS
MECHANICS
MICROSCOPES
MICROSCOPY
OPTICAL MICROSCOPY
PROCESSING
SIMULATION