skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Residual stress-dependent electric conductivity of sputtered co-doped CeO{sub 2} thin-film electrolyte

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3573669· OSTI ID:21560185
; ; ;  [1]
  1. State Key Laboratory of New Ceramics and Fine Processing, Department of Materials Science and Engineering, Tsinghua University, Beijing 100084 (China)

Sm{sup 3+} and Nd{sup 3+} co-doped ceria thin-film electrolytes have been deposited on polycrystalline alumina substrates via RF magnetron sputtering. Electric conductivity is evaluated with respect to the residual stress in the film by sin{sup 2} {psi}-methodology, indicating that an in-plane tensile stress is applied to the as-deposited film. The stress in the film increases as annealing temperature decreases, and there is an enlarged crystal lattice. The results also reveal that the annealed film with a greater stress shows a higher electric conductivity, which might be due to the lower activation energy. The conductivity of the film annealed at 600 deg. C is as high as 0.009 S cm{sup -1} at 500 deg. C, and the residual stress is determined to be 542.70 MPa at room temperature.

OSTI ID:
21560185
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 8; Other Information: DOI: 10.1063/1.3573669; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

Similar Records

Residual Stress Characterization of Al/SiC Nanoscale Multilayers using X-ray
Journal Article · Sat Dec 31 00:00:00 EST 2011 · Thin Solid Films · OSTI ID:21560185

Residual stress characterization of Al/SiC nanoscale multilayers using X-ray
Journal Article · Fri Jan 01 00:00:00 EST 2010 · Thin Solid Films · OSTI ID:21560185

Deposition of aluminum-doped zinc oxide thin films for optical applications using rf and dc magnetron sputter deposition
Journal Article · Thu Jul 15 00:00:00 EDT 2010 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:21560185