In situ analysis of elemental depth distributions in thin films by combined evaluation of synchrotron x-ray fluorescence and diffraction

Journal Article · Wed Jun 15 00:00:00 EDT 2011 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3592288· OSTI ID:21538438

Mainz, R; Klenk, R ^[1]

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1. Helmholtz-Zentrum Berlin, Hahn-Meitner-Platz 1, D-14109 Berlin (Germany)

In this work we present a method for the in situ analysis of elemental depth distributions in thin films using a combined evaluation of synchrotron x-ray fluorescence and energy-dispersive x-ray diffraction signals. We recorded diffraction and fluorescence signals simultaneously during the reactive annealing of thin films. By means of the observed diffraction signals, the time evolution of phases in the thin films during the annealing processes can be determined. We utilized this phase information to parameterize the depth distributions of the elements in the films. The time-dependent fluorescence signals were then taken to determine the parameters representing the parameterized depth distributions. For this latter step, we numerically calculated the fluorescence intensities for a given set of depth distributions. These calculations handle polychromatic excitation and arbitrary functions of depth distributions and take into account primary and secondary fluorescence. Influences of lateral non-uniformities of the films, as well as the accuracy limits of the method, are investigated. We apply the introduced method to analyze the evolution of elemental depth distributions and to quantify the kinetic parameters during a synthesis process of CuInS{sub 2} thin films via the reactive annealing of Cu-In precursors in a sulfur atmosphere.

• OSTI ID: 21538438
• Journal Information: Journal of Applied Physics, Vol. 109, Issue 12; Other Information: DOI: 10.1063/1.3592288; (c) 2011 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
ANNEALING
COPPER COMPOUNDS
COPPER SULFIDES
FLUORESCENCE
INDIUM SULFIDES
MEMBER STATES
SEMICONDUCTOR MATERIALS
SPATIAL DISTRIBUTION
SULFUR
SYNCHROTRON RADIATION
SYNTHESIS
THIN FILMS
TIME DEPENDENCE
X RADIATION
X-RAY DIFFRACTION
X-RAY FLUORESCENCE ANALYSIS
BREMSSTRAHLUNG
CHALCOGENIDES
CHEMICAL ANALYSIS
COHERENT SCATTERING
DIFFRACTION
DISTRIBUTION
ELECTROMAGNETIC RADIATION
ELEMENTS
EMISSION
FILMS
HEAT TREATMENTS
INDIUM COMPOUNDS
IONIZING RADIATIONS
LUMINESCENCE
MATERIALS
NONDESTRUCTIVE ANALYSIS
NONMETALS
PHOTON EMISSION
RADIATIONS
SCATTERING
SULFIDES
SULFUR COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
X-RAY EMISSION ANALYSIS