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Title: Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses

Abstract

We report on experimental study on chemical etch selectivity of fused silica irradiated by femtosecond laser with either linear or circular polarization in a wide range of pulse energies. The relationships between the etch rates and pulse energies are obtained for different polarization states, which can be divided into three different regions. A drop of the etch rate for high pulse energy region is observed and the underlying mechanism is discussed. The advantage of using circularly polarized laser is justified owing to its unique capability of providing a 3D isotropic etch rate.

Authors:
;  [1]; ; ; ;  [1]; ;  [2]
  1. State Key Laboratory of High Field Laser Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, P. O. Box 800-211, Shanghai 201800 (China)
  2. Laser Technology Laboratory, RIKEN - Advanced Science Institute, Hirosawa 2-1, Wako, Saitama 351-0198 (Japan)
Publication Date:
OSTI Identifier:
21538135
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 109; Journal Issue: 5; Other Information: DOI: 10.1063/1.3555080; (c) 2011 American Institute of Physics; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BEAMS; ETCHING; LASER RADIATION; MEMBRANES; MOLECULES; POLARIZATION; POLARIZED BEAMS; PRECURSOR; PULSES; SCREENING; SCREENS; SILICA; SILICON COMPOUNDS; TUNING; ELECTROMAGNETIC RADIATION; MINERALS; OXIDE MINERALS; RADIATIONS; SURFACE FINISHING

Citation Formats

Xiaoming, Yu, Bin, Zeng, Graduate School of the Chinese Academy of Sciences, Beijing 100039, Yang, Liao, Fei, He, Ya, Cheng, Zhizhan, Xu, Sugioka, Koji, and Midorikawa, Katsumi. Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses. United States: N. p., 2011. Web. doi:10.1063/1.3555080.
Xiaoming, Yu, Bin, Zeng, Graduate School of the Chinese Academy of Sciences, Beijing 100039, Yang, Liao, Fei, He, Ya, Cheng, Zhizhan, Xu, Sugioka, Koji, & Midorikawa, Katsumi. Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses. United States. https://doi.org/10.1063/1.3555080
Xiaoming, Yu, Bin, Zeng, Graduate School of the Chinese Academy of Sciences, Beijing 100039, Yang, Liao, Fei, He, Ya, Cheng, Zhizhan, Xu, Sugioka, Koji, and Midorikawa, Katsumi. 2011. "Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses". United States. https://doi.org/10.1063/1.3555080.
@article{osti_21538135,
title = {Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses},
author = {Xiaoming, Yu and Bin, Zeng and Graduate School of the Chinese Academy of Sciences, Beijing 100039 and Yang, Liao and Fei, He and Ya, Cheng and Zhizhan, Xu and Sugioka, Koji and Midorikawa, Katsumi},
abstractNote = {We report on experimental study on chemical etch selectivity of fused silica irradiated by femtosecond laser with either linear or circular polarization in a wide range of pulse energies. The relationships between the etch rates and pulse energies are obtained for different polarization states, which can be divided into three different regions. A drop of the etch rate for high pulse energy region is observed and the underlying mechanism is discussed. The advantage of using circularly polarized laser is justified owing to its unique capability of providing a 3D isotropic etch rate.},
doi = {10.1063/1.3555080},
url = {https://www.osti.gov/biblio/21538135}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 5,
volume = 109,
place = {United States},
year = {Tue Mar 01 00:00:00 EST 2011},
month = {Tue Mar 01 00:00:00 EST 2011}
}