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Title: Focused ion beam and electron microscopy characterization of nanosharp tips and microbumps on silicon and metal thin films formed via localized single-pulse laser irradiation

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3524367· OSTI ID:21538031
 [1];  [2];  [3]
  1. Department of Electrical Engineering, Lake Superior State University, Sault Ste. Marie, Michigan 49783 (United States)
  2. Department of Electrical Engineering and Computer Science, University of Toledo, Toledo, Ohio 43606 (United States)
  3. Department of Bioengineering, University of Toledo, Toledo, Ohio 43606 (United States)

Cross-sections of laser fabricated nanosharp tips and microbumps on silicon and metal thin films are produced and examined in this work. These structures are formed with a Q-switched neodymium doped yttrium aluminum garnet nanosecond-pulse laser, emitting at its fourth harmonic of 266 nm, using a mask projection technique to generate circular laser spots, several microns in diameter. Cross-section of selected structures were produced using a focused ion beam and were characterized via electron microscopy. The diffraction patterns of the silicon samples indicate that the laser formed tip maintains the same single crystal structure as the original silicon film. Examinations of the laser formed structures in metal films confirm that the microbumps are hollow, while revealing that the vertical protrusions are solid.

OSTI ID:
21538031
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 1; Other Information: DOI: 10.1063/1.3524367; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English