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Title: Multipactor susceptibility on a dielectric with a bias dc electric field and a background gas

Abstract

We use Monte Carlo simulations and analytical calculations to derive the condition for the onset of multipactor discharge on a dielectric surface at various combinations of the bias dc electric field, rf electric field, and background pressures of noble gases, such as Argon. It is found that the presence of a tangential bias dc electric field on the dielectric surface lowers the magnitude of rf electric field threshold to initiate multipactor, therefore plausibly offering robust protection against high power microwaves. The presence of low pressure gases may lead to a lower multipactor saturation level, however. The combined effects of tangential dc electric field and external gases on multipactor susceptibility are presented.

Authors:
; ; ;  [1]
  1. Department of Nuclear Engineering and Radiological Sciences, University of Michigan, Ann Arbor, Michigan 48109-2104 (United States)
Publication Date:
OSTI Identifier:
21537839
Resource Type:
Journal Article
Journal Name:
Physics of Plasmas
Additional Journal Information:
Journal Volume: 18; Journal Issue: 5; Other Information: DOI: 10.1063/1.3592990; (c) 2011 American Institute of Physics; Journal ID: ISSN 1070-664X
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; COMPUTERIZED SIMULATION; HIGH-FREQUENCY DISCHARGES; MONTE CARLO METHOD; PLASMA SIMULATION; SWITCHES; CALCULATION METHODS; ELECTRIC DISCHARGES; ELECTRICAL EQUIPMENT; EQUIPMENT; SIMULATION

Citation Formats

Zhang Peng, Lau, Y. Y., Franzi, Matthew, and Gilgenbach, R. M. Multipactor susceptibility on a dielectric with a bias dc electric field and a background gas. United States: N. p., 2011. Web. doi:10.1063/1.3592990.
Zhang Peng, Lau, Y. Y., Franzi, Matthew, & Gilgenbach, R. M. Multipactor susceptibility on a dielectric with a bias dc electric field and a background gas. United States. doi:10.1063/1.3592990.
Zhang Peng, Lau, Y. Y., Franzi, Matthew, and Gilgenbach, R. M. Sun . "Multipactor susceptibility on a dielectric with a bias dc electric field and a background gas". United States. doi:10.1063/1.3592990.
@article{osti_21537839,
title = {Multipactor susceptibility on a dielectric with a bias dc electric field and a background gas},
author = {Zhang Peng and Lau, Y. Y. and Franzi, Matthew and Gilgenbach, R. M.},
abstractNote = {We use Monte Carlo simulations and analytical calculations to derive the condition for the onset of multipactor discharge on a dielectric surface at various combinations of the bias dc electric field, rf electric field, and background pressures of noble gases, such as Argon. It is found that the presence of a tangential bias dc electric field on the dielectric surface lowers the magnitude of rf electric field threshold to initiate multipactor, therefore plausibly offering robust protection against high power microwaves. The presence of low pressure gases may lead to a lower multipactor saturation level, however. The combined effects of tangential dc electric field and external gases on multipactor susceptibility are presented.},
doi = {10.1063/1.3592990},
journal = {Physics of Plasmas},
issn = {1070-664X},
number = 5,
volume = 18,
place = {United States},
year = {2011},
month = {5}
}