Erratum: ''Suppression of near-edge optical absorption band in sputter deposited HfO{sub 2}-Al{sub 2}O{sub 3} nanolaminates containing nonmonoclinic HfO{sub 2}''[Appl. Phys. Lett. 92, 141912 (2008)]

Journal Article · Mon Dec 27 00:00:00 EST 2010 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.3533378· OSTI ID:21518230

Hoppe, E E; Aita, C R ^[1]

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1. Department of Chemistry and Biochemistry, University of Wisconsin-Milwaukee, P.O. Box 413, Milwaukee, Wisconsin 53201 (United States)

No abstract prepared.

• OSTI ID: 21518230
• Journal Information: Applied Physics Letters, Vol. 97, Issue 26; Other Information: DOI: 10.1063/1.3533378; (c) 2010 American Institute of Physics; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
77 NANOSCIENCE AND NANOTECHNOLOGY
ABSORPTION
ALUMINIUM OXIDES
COMPOSITE MATERIALS
DEPOSITION
HAFNIUM OXIDES
INHIBITION
NANOSTRUCTURES
SPUTTERING
ALUMINIUM COMPOUNDS
CHALCOGENIDES
HAFNIUM COMPOUNDS
MATERIALS
OXIDES
OXYGEN COMPOUNDS
REFRACTORY METAL COMPOUNDS
SORPTION
TRANSITION ELEMENT COMPOUNDS