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Title: Ion and electron beam nanofabrication of the which-way double-slit experiment in a transmission electron microscope

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3529947· OSTI ID:21518228
 [1];  [2];  [3]
  1. Department of Physics, University of Modena and Reggio Emilia and CNR-Institute of Nanoscience-S3, via G. Campi 213/a, 41100 Modena (Italy)
  2. CNR-Institute of Nanoscience-S3, via G. Campi 213/a, 41100 Modena (Italy)
  3. Department of Physics, University of Bologna, viale B. Pichat 6/2, 40127 Bologna (Italy)

We have realized a which-way experiment closely resembling the original Feynman's proposal exploiting focused ion beam milling to prepare two nanoslits and electron beam induced deposition to grow, selectively over one of them, electron transparent layers of low atomic number amorphous material to realize a which-way detector for high energy electrons. By carrying out the experiment in an electron microscope equipped with an energy filter, we show that the inelastic scattering of electron transmitted through amorphous layers of different thicknesses provides the control of the dissipative interaction process responsible for the localization phenomena which cancels out the interference effects.

OSTI ID:
21518228
Journal Information:
Applied Physics Letters, Vol. 97, Issue 26; Other Information: DOI: 10.1063/1.3529947; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English