Evaluation of surface damage on organic materials irradiated with Ar cluster ion beam

Journal Article · Fri Jan 07 00:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3548386· OSTI ID:21513139

Yamamoto, Y; Ichiki, K ^[1]; Ninomiya, S; Matsuo, J ^[2]; Seki, T ^[1]; Aoki, T ^[3]

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1. Department of Nuclear Engineering, Kyoto University, Sakyo, Kyoto, 606-8501 (Japan)
2. Quantum Science and Education Center, Gokasho, Uji, Kyoto, 611-0011 (Japan)
3. Department of Electronic Science and Engineering, Kyoto University, Nishikyo, Kyoto, 615-8530 (Japan)

The sputtering yields of organic materials under large cluster ion bombardment are much higher than those under conventional monomer ion bombardment. The sputtering rate of arginine remains constant with fluence for an Ar cluster ion beam, but decreases with fluence for Ar monomer. Additionally, because Ar cluster etching induces little damage, Ar cluster ion can be used to achieve molecular depth profiling of organic materials. In this study, we evaluated the damage to poly methyl methacrylate (PMMA) and arginine samples irradiated with Ar atomic and Ar cluster ion beams. Arginine samples were analyzed by secondary ion mass spectrometry (SIMS) and PMMA samples were analyzed by X-ray photoelectron spectroscopy (XPS). The chemical structure of organic materials remained unchanged after Ar cluster irradiation, but was seriously damaged. These results indicated that bombardment with Ar cluster ions induced less surface damage than bombardment with Ar atomic ion. The damage layer thickness with 5 keV Ar cluster ion bombardment was less than 1 nm.

• OSTI ID: 21513139
• Journal Information: AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548386; (c) 2010 American Institute of Physics; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
ARGININE
ARGON
ATOMIC CLUSTERS
ATOMIC IONS
BINDING ENERGY
DEPTH
ETCHING
ION BEAMS
ION MICROPROBE ANALYSIS
ION PAIRS
IRRADIATION
KEV RANGE 01-10
LAYERS
MASS SPECTROSCOPY
METHACRYLIC ACID ESTERS
MONOMERS
PMMA
SPUTTERING
SURFACES
X-RAY PHOTOELECTRON SPECTROSCOPY
AMINO ACIDS
BEAMS
CARBOXYLIC ACID ESTERS
CARBOXYLIC ACIDS
CHARGED PARTICLES
CHEMICAL ANALYSIS
DIMENSIONS
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY
ENERGY RANGE
ESTERS
FLUIDS
GASES
IONS
KEV RANGE
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
NONMETALS
ORGANIC ACIDS
ORGANIC COMPOUNDS
ORGANIC POLYMERS
PHOTOELECTRON SPECTROSCOPY
POLYACRYLATES
POLYMERS
POLYVINYLS
RARE GASES
SPECTROSCOPY
SURFACE FINISHING