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Title: Multi-Frequency Microwaves Plasma Production for Active Profile Control of Ion Beams on a Large Bore ECR Ion Source with Permanent Magnets

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3548452· OSTI ID:21510126
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  1. Division of Electrical, Electronic and Information Engineering, Graduate School of Engineering, Osaka Univ. 2-1 Yamada-oka, Suita-shi, Osaka 565-0871 (Japan)

A new concept on magnetic field of plasma production and confinement by using permanent magnets, i.e. cylindrically comb-shaped magnets, has been proposed to enhance efficiency of an electron cyclotron resonance (ECR) plasma for broad and dense ion beam source under the low pressure and also the low microwave power. The resonance zones corresponding to the fundamental ECR for 2.45 GHz and 11-13 GHz frequency are constructed at different positions. The profiles of the plasma parameters in the ECR ion source are different from each frequency of microwave. Large bore extractor is set at the opposite side against the microwave feeds. It is found that differences of their profiles also appear at those of ion beam profiles. We conducted to launch simultaneously multiplex frequency microwaves controlled individually, and tried to control the profiles of the plasma parameters and then those of extracted ion beam.

OSTI ID:
21510126
Journal Information:
AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548452; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English