Preferential refilling and planarization of grooves with amorphous carbon by using gas cluster ion beam irradiations
- Incubation center, Graduate school of engineering, University of Hyogo 2167 Shosha, Himeji, Hyogo, 671-2280 (Japan)
Surface planarization is important for fabrication of patterned media. One of the methods is smoothing of the patterned surface after deposition of refilling materials. However it requires two process steps. In this study, we studied planarization of patterned media by formation of refilling films with gas cluster ion beam (GCIB) assisted deposition to reduce the process step. Hard amorphous carbon films were deposited on line-and-space pattern (100 nm pitch, 20 nm in depth) by using Ar-GCIB assisted deposition. From the atomic force microscope and the cross-sectional transmission electron microscope observations, the line-and-space patterns were refilled with amorphous carbon films with Ar-GCIB assisted deposition and smooth surface was obtained. The thickness of the amorphous carbon film required for surface planarization was 32 nm, which was very small compared to the initial peak to valley (20 nm). By using this method, sputtering process for planarization can be omitted.
- OSTI ID:
- 21510108
- Journal Information:
- AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548388; (c) 2010 American Institute of Physics; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMORPHOUS STATE
ATOMIC FORCE MICROSCOPY
CARBON
DEPOSITION
FILMS
ION BEAMS
ION PAIRS
IRRADIATION
POLARIZATION
SPUTTERING
SURFACES
THICKNESS
TRANSMISSION ELECTRON MICROSCOPY
BEAMS
DIMENSIONS
ELECTRON MICROSCOPY
ELEMENTS
MICROSCOPY
NONMETALS