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Title: Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H{sub 2} and N{sub 2} mixture gases

Abstract

Surface loss probabilities of hydrogen (H) and nitrogen (N) radicals on different wall materials in H{sub 2}/N{sub 2} mixture plasmas have been investigated by employing vacuum ultraviolet (VUV) absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. The surface loss probability of a radical was calculated by using the lifetime obtained from the decay curve of the radical density in afterglow plasmas. The surface loss probabilities on different walls in the H{sub 2}/N{sub 2} mixture plasmas were higher than those in a pure H{sub 2} or N{sub 2} plasma. The behaviors of species such as ions and VUV photons as a function of the gas mixture ratio were measured to investigate those influences on plasma-surface interactions. In addition, changes on the surface exposed to the plasma were analyzed by x-ray photoelectron spectroscopy. Quantitative measurements of surface loss probabilities of radicals on various wall materials are expected to be crucially important in achieving good understanding of the interaction between the surface and the plasma.

Authors:
;  [1];  [2]; ;  [1];  [3];  [3]
  1. Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Nagoya 463-8603 (Japan)
  2. Plasma Center for Industrial Applications, Nagoya Urban Industries Promotion Corporation, Nagoya 463-0003 (Japan)
  3. Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012 (Japan)
Publication Date:
OSTI Identifier:
21476241
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 107; Journal Issue: 10; Other Information: DOI: 10.1063/1.3372750; (c) 2010 American Institute of Physics; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; ABSORPTION SPECTROSCOPY; AFTERGLOW; FAR ULTRAVIOLET RADIATION; HOLLOW CATHODES; HYDROGEN; LIFETIME; NITROGEN; PHOTONS; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; RADICALS; SURFACES; THERMONUCLEAR REACTOR MATERIALS; WALL EFFECTS; X-RAY PHOTOELECTRON SPECTROSCOPY; BOSONS; CATHODES; ELECTRODES; ELECTROMAGNETIC RADIATION; ELECTRON SPECTROSCOPY; ELEMENTARY PARTICLES; ELEMENTS; MASSLESS PARTICLES; MATERIALS; NONMETALS; PHOTOELECTRON SPECTROSCOPY; RADIATIONS; SPECTROSCOPY; ULTRAVIOLET RADIATION

Citation Formats

Moon, Chang Sung, Takeda, Keigo, Takashima, Seigo, Sekine, Makoto, Hori, Masaru, Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Setsuhara, Yuichi, Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Shiratani, Masaharu, and Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581. Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H{sub 2} and N{sub 2} mixture gases. United States: N. p., 2010. Web. doi:10.1063/1.3372750.
Moon, Chang Sung, Takeda, Keigo, Takashima, Seigo, Sekine, Makoto, Hori, Masaru, Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Setsuhara, Yuichi, Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Shiratani, Masaharu, & Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581. Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H{sub 2} and N{sub 2} mixture gases. United States. doi:10.1063/1.3372750.
Moon, Chang Sung, Takeda, Keigo, Takashima, Seigo, Sekine, Makoto, Hori, Masaru, Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012, Setsuhara, Yuichi, Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047, Shiratani, Masaharu, and Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581. Sat . "Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H{sub 2} and N{sub 2} mixture gases". United States. doi:10.1063/1.3372750.
@article{osti_21476241,
title = {Surface loss probabilities of H and N radicals on different materials in afterglow plasmas employing H{sub 2} and N{sub 2} mixture gases},
author = {Moon, Chang Sung and Takeda, Keigo and Takashima, Seigo and Sekine, Makoto and Hori, Masaru and Core Research for Evolutional Science and Technology, Japan Science and Technology Agency, Kawaguchi, Saitama 332-0012 and Setsuhara, Yuichi and Joining and Welding Research Institute, Osaka University, Ibaraki, Osaka 567-0047 and Shiratani, Masaharu and Department of Electronics, Graduate School of Information Science and Electrical Engineering, Kyushu University, Fukuoka 812-8581},
abstractNote = {Surface loss probabilities of hydrogen (H) and nitrogen (N) radicals on different wall materials in H{sub 2}/N{sub 2} mixture plasmas have been investigated by employing vacuum ultraviolet (VUV) absorption spectroscopy with a high pressure microdischarge hollow cathode lamp as a light source. The surface loss probability of a radical was calculated by using the lifetime obtained from the decay curve of the radical density in afterglow plasmas. The surface loss probabilities on different walls in the H{sub 2}/N{sub 2} mixture plasmas were higher than those in a pure H{sub 2} or N{sub 2} plasma. The behaviors of species such as ions and VUV photons as a function of the gas mixture ratio were measured to investigate those influences on plasma-surface interactions. In addition, changes on the surface exposed to the plasma were analyzed by x-ray photoelectron spectroscopy. Quantitative measurements of surface loss probabilities of radicals on various wall materials are expected to be crucially important in achieving good understanding of the interaction between the surface and the plasma.},
doi = {10.1063/1.3372750},
journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 10,
volume = 107,
place = {United States},
year = {2010},
month = {5}
}