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Title: Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time- and space-resolved optical emission spectroscopy and fast imaging

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3305319· OSTI ID:21476142
; ; ; ;  [1]
  1. Department of Engineering Physics, Ecole Polytechnique, P.O. Box 6079, station Downtown, Montreal, Quebec H3C 3A7 (Canada)

Time- and space-resolved optical emission spectroscopy and fast imaging were used for the investigation of the plasma dynamics of high-power impulse magnetron sputtering discharges. 200 {mu}s pulses with a 50 Hz repetition frequency were applied to a Cr target in Ar, N{sub 2}, and N{sub 2}/Ar mixtures and in a pressure range from 0.7 to 2.66 Pa. The power density peaked at 2.2-6 kW cm{sup -2}. Evidence of dominating self-sputtering was found for all investigated conditions. Up to four different discharge phases within each pulse were identified: (i) the ignition phase, (ii) the high-current metal-dominated phase, (iii) the transient phase, and (iv) the low-current gas-dominated phase. The emission of working gas excited by fast electrons penetrating the space in-between the electrodes during the ignition phase spread far outwards from the target at a speed of 24 km s{sup -1} in 1.3 Pa of Ar and at 7.5 km s{sup -1} in 1.3 Pa of N{sub 2}. The dense metal plasma created next to the target propagated in the reactor at a speed ranging from 0.7 to 3.5 km s{sup -1}, depending on the working gas composition and the pressure. In fact, it increased with higher N{sub 2} concentration and lower pressure. The form of the propagating plasma wave changed from a hemispherical shape in Ar, to a droplike shape extending far from the target in N{sub 2}. An important N{sub 2} emission rise in the latter case was detected during the transition at the end of the metal-dominated phase.

OSTI ID:
21476142
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 4; Other Information: DOI: 10.1063/1.3305319; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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