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Title: Optical characterization of a-As{sub 2}S{sub 3} thin films prepared by magnetron sputtering

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3295908· OSTI ID:21476125
; ; ; ;  [1]
  1. Department of Electrical and Computer Engineering, Texas A and M University, 214 Zachry Engineering Center, College Station, Texas 77843-3128 (United States)

It is well known that thermally evaporated a-As{sub 2}S{sub 3} thin films are prone to oxidation when exposed to ambient environment. These As{sub 2}O{sub 3} crystals can have a devastating effect on propagating light by introducing a major source of scattering loss in submicron optically integrated circuits. Magnetron sputtering a-As{sub 2}S{sub 3} not only produces films that have optical properties closer to their equilibrium state like their bulk glass counter parts, the as-deposited films also show no detectable signs of As{sub 2}O{sub 3} crystals in them when they are exposed to the ambient environment. These attributes are unique to a magnetron sputtered a-As{sub 2}S{sub 3} film and are probably caused by the ''photoannealing'' effect from the visible light emitted by the argon plasma during the sputtering process. The optical properties of a magnetron sputtered a-As{sub 2}S{sub 3} film and its propagation loss on a Ti diffused LiNbO{sub 3} waveguide are reported here. The thin film results agree closely with published data on As{sub 2}S{sub 3} bulk glass, and the optical properties of the as-deposited film are found to be closer to its bulk glass values than films made by thermal evaporation and pulsed laser deposition. The TM propagation loss at {lambda}=1.5 {mu}m of the as-deposited a-As{sub 2}S{sub 3} waveguide on Ti:LiNbO{sub 3} was 0.20{+-}0.05 dB/cm.

OSTI ID:
21476125
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 3; Other Information: DOI: 10.1063/1.3295908; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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