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Title: Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process

Abstract

In remote microwave plasma enhanced chemical vapor deposition processes operated at atmospheric pressure, high deposition rates are associated with the localization of precursors on the treated surface. We show that mass transport can be advantageously ensured by convection for the heavier precursor, the lighter being driven by turbulent diffusion toward the surface. Transport by laminar diffusion is negligible. The use of high flow rates is mandatory to have a good mixing of species. The use of an injection nozzle with micrometer-sized hole enables us to define accurately the reaction area between the reactive species. The localization of the flow leads to high deposition rates by confining the reactive species over a small area, the deposition yield being therefore very high. Increasing the temperature modifies nonlinearly the deposition rates and the coating properties.

Authors:
; ; ;  [1];  [2]
  1. Department of Chemistry and Physics of Solids and Surfaces, Institut Jean Lamour, Nancy-Universite, CNRS, Parc de Saurupt, CS 14234, F-54042 Nancy Cedex (France)
  2. AGC Flat Coating, 2 Rue de l'aurore, B-6040 Jumet (Belgium)
Publication Date:
OSTI Identifier:
21476116
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 107; Journal Issue: 2; Other Information: DOI: 10.1063/1.3294966; (c) 2010 American Institute of Physics; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; CONVECTION; DIFFUSION; FLOW RATE; MASS; MICROWAVE RADIATION; PLASMA; PRECURSOR; SURFACES; TEMPERATURE DEPENDENCE; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; ENERGY TRANSFER; HEAT TRANSFER; MASS TRANSFER; RADIATIONS; SURFACE COATING

Citation Formats

Cardoso, R P, Belmonte, T, Henrion, G, Gries, T, and Tixhon, E. Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process. United States: N. p., 2010. Web. doi:10.1063/1.3294966.
Cardoso, R P, Belmonte, T, Henrion, G, Gries, T, & Tixhon, E. Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process. United States. https://doi.org/10.1063/1.3294966
Cardoso, R P, Belmonte, T, Henrion, G, Gries, T, and Tixhon, E. Fri . "Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process". United States. https://doi.org/10.1063/1.3294966.
@article{osti_21476116,
title = {Analysis of mass transport in an atmospheric pressure remote plasma-enhanced chemical vapor deposition process},
author = {Cardoso, R P and Belmonte, T and Henrion, G and Gries, T and Tixhon, E},
abstractNote = {In remote microwave plasma enhanced chemical vapor deposition processes operated at atmospheric pressure, high deposition rates are associated with the localization of precursors on the treated surface. We show that mass transport can be advantageously ensured by convection for the heavier precursor, the lighter being driven by turbulent diffusion toward the surface. Transport by laminar diffusion is negligible. The use of high flow rates is mandatory to have a good mixing of species. The use of an injection nozzle with micrometer-sized hole enables us to define accurately the reaction area between the reactive species. The localization of the flow leads to high deposition rates by confining the reactive species over a small area, the deposition yield being therefore very high. Increasing the temperature modifies nonlinearly the deposition rates and the coating properties.},
doi = {10.1063/1.3294966},
url = {https://www.osti.gov/biblio/21476116}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 2,
volume = 107,
place = {United States},
year = {2010},
month = {1}
}