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Title: Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction study

Abstract

The present study deals with the analysis of elastic strains and stresses in high-quality heteroepitaxial Mo/Ni superlattices with periods {Lambda} lying in the range 4.8-27.6 nm. The strain-stress state in this lattice-mismatched system grown under energetic deposition conditions (ion beam sputtering) is rather complex, resulting from three contributions: (i) intrinsic (growth) stress due to atomic peening, (ii) coherency stresses of opposite sign in the two elemental layers due to the observed Nishiyama-Wassermann epitaxial relationship Ni[110](111)||Mo[001](110), and (iii) interfacial mixing. The measurement of the lattice parameters of Mo and Ni sublayers in various crystallographic directions was performed by x-ray diffraction, using the sin{sup 2} {psi} method adapted for epitaxial layers. A large anisotropy of elastic strain and associated in-plane coherency stresses is revealed in the Mo sublayers, while for Ni sublayers no such behavior could be detected due to the superimposition of growth variants with threefold symmetry. Postgrowth ion irradiation with Ar ions at very low dose ({approx}0.2 dpa) was employed as a powerful tool to modify the intrinsic stress, thus providing additional data to be implemented in a triaxial strain-stress model, which enabled us to separate the different stress sources (intrinsic and coherency stresses) as well as to quantify themore » intermixing occurring during growth. This model, which has been successfully applied previously to Mo thin films, yields in the case of multilayer systems to the determination of the ''stress-free and defect-free'' lattice parameter, a{sub 0}, i.e., solely linked to chemical mixing. The linear dependence of a{sub 0} with {Lambda} observed in both sublayers reveals an interface-mediated chemical mixing mechanism, the extent of this interfacial mixing being much more pronounced in Mo sublayers than in Ni ones.« less

Authors:
; ; ; ; ;  [1]
  1. Laboratoire PHYMAT, Universite de Poitiers, UMR CNRS 6630, SP2MI, Bd. Pierre et Marie Curie, BP 30179, 86962 Chasseneuil-Futuroscope (France)
Publication Date:
OSTI Identifier:
21476106
Resource Type:
Journal Article
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 107; Journal Issue: 2; Other Information: DOI: 10.1063/1.3284079; (c) 2010 American Institute of Physics; Journal ID: ISSN 0021-8979
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; ARGON IONS; ATOMIC DISPLACEMENTS; CRYSTAL STRUCTURE; ELASTICITY; EPITAXY; INTERFACES; ION BEAMS; ION IMPLANTATION; IRRADIATION; LATTICE PARAMETERS; LAYERS; MOLYBDENUM; NICKEL; SHOT PEENING; SPUTTERING; STRAINS; STRESSES; SUPERLATTICES; THIN FILMS; X-RAY DIFFRACTION; BEAMS; CHARGED PARTICLES; COHERENT SCATTERING; COLD WORKING; CRYSTAL GROWTH METHODS; DIFFRACTION; ELEMENTS; FABRICATION; FILMS; IONS; MATERIALS WORKING; MECHANICAL PROPERTIES; METALS; PHYSICAL RADIATION EFFECTS; RADIATION EFFECTS; REFRACTORY METALS; SCATTERING; SURFACE TREATMENTS; TRANSITION ELEMENTS

Citation Formats

Abadias, G, Debelle, A, Michel, A, Jaouen, C, Martin, F, and Pacaud, J. Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction study. United States: N. p., 2010. Web. doi:10.1063/1.3284079.
Abadias, G, Debelle, A, Michel, A, Jaouen, C, Martin, F, & Pacaud, J. Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction study. United States. https://doi.org/10.1063/1.3284079
Abadias, G, Debelle, A, Michel, A, Jaouen, C, Martin, F, and Pacaud, J. 2010. "Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction study". United States. https://doi.org/10.1063/1.3284079.
@article{osti_21476106,
title = {Anisotropic strain-stress state and intermixing in epitaxial Mo(110)/Ni(111) multilayers: An x-ray diffraction study},
author = {Abadias, G and Debelle, A and Michel, A and Jaouen, C and Martin, F and Pacaud, J},
abstractNote = {The present study deals with the analysis of elastic strains and stresses in high-quality heteroepitaxial Mo/Ni superlattices with periods {Lambda} lying in the range 4.8-27.6 nm. The strain-stress state in this lattice-mismatched system grown under energetic deposition conditions (ion beam sputtering) is rather complex, resulting from three contributions: (i) intrinsic (growth) stress due to atomic peening, (ii) coherency stresses of opposite sign in the two elemental layers due to the observed Nishiyama-Wassermann epitaxial relationship Ni[110](111)||Mo[001](110), and (iii) interfacial mixing. The measurement of the lattice parameters of Mo and Ni sublayers in various crystallographic directions was performed by x-ray diffraction, using the sin{sup 2} {psi} method adapted for epitaxial layers. A large anisotropy of elastic strain and associated in-plane coherency stresses is revealed in the Mo sublayers, while for Ni sublayers no such behavior could be detected due to the superimposition of growth variants with threefold symmetry. Postgrowth ion irradiation with Ar ions at very low dose ({approx}0.2 dpa) was employed as a powerful tool to modify the intrinsic stress, thus providing additional data to be implemented in a triaxial strain-stress model, which enabled us to separate the different stress sources (intrinsic and coherency stresses) as well as to quantify the intermixing occurring during growth. This model, which has been successfully applied previously to Mo thin films, yields in the case of multilayer systems to the determination of the ''stress-free and defect-free'' lattice parameter, a{sub 0}, i.e., solely linked to chemical mixing. The linear dependence of a{sub 0} with {Lambda} observed in both sublayers reveals an interface-mediated chemical mixing mechanism, the extent of this interfacial mixing being much more pronounced in Mo sublayers than in Ni ones.},
doi = {10.1063/1.3284079},
url = {https://www.osti.gov/biblio/21476106}, journal = {Journal of Applied Physics},
issn = {0021-8979},
number = 2,
volume = 107,
place = {United States},
year = {Fri Jan 15 00:00:00 EST 2010},
month = {Fri Jan 15 00:00:00 EST 2010}
}