Spectroscopic ellipsometry study of hydrogenated amorphous silicon carbon alloy films deposited by plasma enhanced chemical vapor deposition

Journal Article · Fri Jan 15 00:00:00 EST 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3277016· OSTI ID:21476103

Basa, D K ^[1]; Abbate, G; Ambrosone, G; Marino, A ^[2]; Coscia, U ^[2]

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1. Department of Physics, Utkal University, Bhubaneswar 751004 (India)
2. Dipartimento di Scienze Fisiche, Universita di Napoli 'Federico II', Complesso Universitario MSA, via Cintia, 80126 Napoli (Italy)

The optical properties of the hydrogenated amorphous silicon carbon alloy films, prepared by plasma enhanced chemical vapor deposition technique from silane and methane gas mixture diluted in helium, have been investigated using variable angle spectroscopic ellipsometry in the photon energy range from 0.73 to 4.59 eV. Tauc-Lorentz model has been employed for the analysis of the optical spectra and it has been demonstrated that the model parameters are correlated with the carbon content as well as to the structural properties of the studied films.

• OSTI ID: 21476103
• Journal Information: Journal of Applied Physics, Vol. 107, Issue 2; Other Information: DOI: 10.1063/1.3277016; (c) 2010 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ABSORPTION SPECTRA
AMORPHOUS STATE
CARBON
CHEMICAL VAPOR DEPOSITION
DIELECTRIC MATERIALS
ELLIPSOMETRY
EV RANGE
HELIUM
INTERMETALLIC COMPOUNDS
METHANE
OPTICAL PROPERTIES
PLASMA
SEMICONDUCTOR MATERIALS
SILANES
SILICON
THIN FILMS
ALKANES
ALLOYS
CHEMICAL COATING
DEPOSITION
ELEMENTS
ENERGY RANGE
FILMS
FLUIDS
GASES
HYDRIDES
HYDROCARBONS
HYDROGEN COMPOUNDS
MATERIALS
MEASURING METHODS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
PHYSICAL PROPERTIES
RARE GASES
SEMIMETALS
SILICON COMPOUNDS
SPECTRA
SURFACE COATING