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Title: Self-initiating volume discharge in iodides used for producing atomic iodine in pulsed chemical oxygen - iodine lasers

Journal Article · · Quantum Electronics (Woodbury, N.Y.)
 [1]; ; ;  [2]
  1. Institute for High Energy Densities, Associated Institute for High Temperatures, Russian Academy of Sciences, Moscow (Russian Federation)
  2. A.M. Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)

A volume self-sustained discharge (VSD) in iodides (C{sub 3}H{sub 7}I, C{sub 4}H{sub 9}I) and in their mixtures with SF{sub 6}, N{sub 2}, and O{sub 2} in the presence of small-scale inhomogeneities on the cathode surface is shown to develop in the form of a self-initiating volume discharge (SIVD), i.e., a volume discharge without any preionisation including discharge gaps with a strong edge enhancement of the electric field. Additions of SF{sub 6} or N{sub 2} to the iodides improves the stability and homogeneity of the SIVD, while adding up to 300 % (relative to the partial iodide pressure) of O{sub 2} to these mixtures has only an insignificant effect on the discharge stability. The possibility of SIVD initiation was modelled experimentally in a 1.5-L discharge volume. For the C{sub 4}H{sub 9}I:O{sub 2}:SF{sub 6}=0.083:0.25:0.67 mixture at a pressure of 72 Torr, the specific energy input into the discharge plasma ranged up to 130 J L{sup -1} in this geometry. A conclusion was drawn that the SIVD is promising for the production of atomic iodine in the pulsed and repetitively pulsed operating regimes of a chemical oxygen - iodine laser. (lasers)

OSTI ID:
21470326
Journal Information:
Quantum Electronics (Woodbury, N.Y.), Vol. 33, Issue 6; Other Information: DOI: 10.1070/QE2003v033n06ABEH002441; ISSN 1063-7818
Country of Publication:
United States
Language:
English