A capillary discharge plasma source of intense VUV radiation

Journal Article · Fri Jan 31 00:00:00 EST 2003 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2003V033N01ABEH002357· OSTI ID:21470253

Sobel'man, Igor I; Shevelko, A P; Yakushev, O F ^[1]; Knight, L V; Turley, R S ^[2]

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1. P.N. Lebedev Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)
2. Brigham Young University, Provo (United States)

The results of investigation of a capillary discharge plasma, used as a source of intense VUV radiation and soft X-rays, are presented. The plasma was generated during the discharge of low-inductance condensers in a gas-filled ceramic capillary. Intense line radiation was observed in a broad spectral range (30-400 A) in various gases (CO{sub 2}, Ne, Ar, Kr, Xe). The absolute radiation yield for the xenon discharge was {approx}5 mJ (2{pi} sr){sup -1} pulse{sup -1} within a spectral band of width 9 A at 135 A. Such a radiation source can be used for various practical applications, such as EUV projection lithography, microscopy of biological objects in a 'water window', reflectometry, etc. (special issue devoted to the 80th anniversary of academician n g basov's birth)

• OSTI ID: 21470253
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 33, Issue 1; Other Information: DOI: 10.1070/QE2003v033n01ABEH002357; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ARGON
CARBON DIOXIDE
ELECTRIC DISCHARGES
FAR ULTRAVIOLET RADIATION
INDUCTANCE
KRYPTON
LINE WIDTHS
MICROSCOPY
NEON
PLASMA
RADIATION SOURCES
SOFT X RADIATION
XENON
CARBON COMPOUNDS
CARBON OXIDES
CHALCOGENIDES
ELECTRICAL PROPERTIES
ELECTROMAGNETIC RADIATION
ELEMENTS
FLUIDS
GASES
IONIZING RADIATIONS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
RADIATIONS
RARE GASES
ULTRAVIOLET RADIATION
X RADIATION