Photoinduced laser etching of a diamond surface

Journal Article · Fri Nov 30 00:00:00 EST 2007 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2007V037N11ABEH013515· OSTI ID:21466764

Komlenok, M S; Pimenov, S M; Konov, V I ^[1]

---

1. Natural Science Center, A.M. Prokhorov General Physics Institute, Russian Academy of Sciences, Moscow (Russian Federation)

Nongraphitising ablation of the surface of a natural diamond single crystal irradiated by nanosecond UV laser pulses is studied experimentally. For laser fluences below the diamond graphitisation threshold, extremely low diamond etching rates (less than 1nm/1000 pulses) are obtained and the term nanoablation is used just for this process. The dependence of the nanoablation rate on the laser fluence is studied for samples irradiated both in air and in oxygen-free atmosphere. The effect of external heating on the nanoablation rate is analysed and a photochemical mechanism is proposed for describing it. (interaction of laser radiation with matter. laser plasma)

• OSTI ID: 21466764
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 37, Issue 11; Other Information: DOI: 10.1070/QE2007v037n11ABEH013515; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABLATION
AIR
CONTROLLED ATMOSPHERES
DIAMONDS
ETCHING
HEATING
LASER RADIATION
LASERS
MONOCRYSTALS
OXYGEN
PHOTOCHEMISTRY
PHOTON BEAMS
PULSES
SURFACES
ULTRAVIOLET RADIATION
ATMOSPHERES
BEAMS
CARBON
CHEMISTRY
CRYSTALS
ELECTROMAGNETIC RADIATION
ELEMENTS
FLUIDS
GASES
MINERALS
NONMETALS
RADIATIONS
SURFACE FINISHING