Defects of a phosphosilicate glass exposed to the 193-nm radiation

Journal Article · Sat Jun 30 00:00:00 EDT 2007 · Quantum Electronics (Woodbury, N.Y.)

DOI:https://doi.org/10.1070/QE2007V037N06ABEH013485· OSTI ID:21466680

Larionov, Yu V; Sokolov, V O; Plotnichenko, V G ^[1]

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1. Fiber Optics Research Center, Russian Academy of Sciences, Moscow (Russian Federation)

Induced absorption is measured in a hydrogen-unloaded phosphosilicate glass (PSG) in spectral ranges from 140 to 850 nm and from 1000 to 1700 nm before and after its exposure to the 193-nm radiation. It is shown that the induced-absorption bands in the range between 140 and 300 nm do not coincide with the bands observed earlier after exposing a PSG to X-rays. It is assumed that the photorefractive effect in the PSG is related to variations induced in the glass network rather than to defects responsible for the induced-absorption bands. (fiber and integrated optics)

• OSTI ID: 21466680
• Journal Information: Quantum Electronics (Woodbury, N.Y.), Vol. 37, Issue 6; Other Information: DOI: 10.1070/QE2007v037n06ABEH013485; ISSN 1063-7818
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABSORPTION
GLASS
HYDROGEN
RADIATION EFFECTS
SILICATES
X RADIATION
ELECTROMAGNETIC RADIATION
ELEMENTS
IONIZING RADIATIONS
NONMETALS
OXYGEN COMPOUNDS
RADIATIONS
SILICON COMPOUNDS
SORPTION