Formation of nanostructures upon laser ablation of a binary Si{sub x}(SiO{sub 2}){sub 1-x} mixture
Journal Article
·
· Quantum Electronics (Woodbury, N.Y.)
- D.V. Skobel'tsyn Institute of Nuclear Physics, M.V. Lomonosov Moscow State University, Moscow (Russian Federation)
The formation efficiency of fractal nanostructures is studied experimentally depending on the composition of the binary silicon-silica mixture during evaporation by millisecond laser pulse. The influence of percolation on the efficiency of nanostructure formation in a laser plume is discovered. It is found that the efficiency is maximal near the critical densities of atoms in the plasma, which correspond both to the three-dimensional and two-dimensional percolation. The dependences of the effective temperatures of the laser plasma and the intensity of spectral lines on the target composition are presented. (interaction of laser radiation with matter. laser plasma)
- OSTI ID:
- 21466641
- Journal Information:
- Quantum Electronics (Woodbury, N.Y.), Vol. 37, Issue 4; Other Information: DOI: 10.1070/QE2007v037n04ABEH013345; ISSN 1063-7818
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
70 PLASMA PHYSICS AND FUSION TECHNOLOGY
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABLATION
ATOMS
EFFICIENCY
EVAPORATION
LASER RADIATION
LASER-PRODUCED PLASMA
MIXTURES
NANOSTRUCTURES
PLASMA DENSITY
PLUMES
PULSES
SILICON
SILICON OXIDES
THREE-DIMENSIONAL CALCULATIONS
TWO-DIMENSIONAL CALCULATIONS
CHALCOGENIDES
DISPERSIONS
ELECTROMAGNETIC RADIATION
ELEMENTS
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PLASMA
RADIATIONS
SEMIMETALS
SILICON COMPOUNDS
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ABLATION
ATOMS
EFFICIENCY
EVAPORATION
LASER RADIATION
LASER-PRODUCED PLASMA
MIXTURES
NANOSTRUCTURES
PLASMA DENSITY
PLUMES
PULSES
SILICON
SILICON OXIDES
THREE-DIMENSIONAL CALCULATIONS
TWO-DIMENSIONAL CALCULATIONS
CHALCOGENIDES
DISPERSIONS
ELECTROMAGNETIC RADIATION
ELEMENTS
OXIDES
OXYGEN COMPOUNDS
PHASE TRANSFORMATIONS
PLASMA
RADIATIONS
SEMIMETALS
SILICON COMPOUNDS