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Title: Annealing effect on the optical response and interdiffusion of n-ZnO/p-Si (111) heterojunction grown by atomic layer deposition

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3511284· OSTI ID:21464542
;  [1];  [2];  [3];  [1]
  1. National Synchrotron Radiation Research Center, 101 Hsin-Ann Road, Hsinchu Science Park, Hsinchu 30076, Taiwan (China)
  2. Program for Science and Technology of Accelerator Light Source, National Chiao Tung University, Hsinchu 300, Taiwan (China)
  3. Department of Applied Science, National Hsinchu University of Education, Hsinchu 300, Taiwan (China)

Optical and structural properties of n-ZnO films grown on a p-Si (111) substrate by atomic layer deposition were observed using in situ synchrotron x-ray diffraction during annealing. The photoluminescence showed a complicated photon response with increasing annealing temperature. In situ x-ray diffraction indicated the growth of grains for an annealing temperature from 500 to 800 deg. C with the orientation altering from polycrystalline to preferential (200). Measurements with a time-of-flight secondary-ion mass spectrometer indicated that the outgassing of hydrogen atoms and ZnO/Si interdiffusion behavior were correlated with the intensity and position of emissions in photoluminescence spectra.

OSTI ID:
21464542
Journal Information:
Applied Physics Letters, Vol. 97, Issue 18; Other Information: DOI: 10.1063/1.3511284; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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