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Title: Full Multilayer Laue Lens for Focusing Hard X-rays

Abstract

Multilayer Laue Lenses (MLLs) were developed by us using dynamic diffraction effects to efficiently focus hard x-rays to very small spots. Using a partial MLL we were able to focus 19.5-keV hard x-rays to a line focus of 16 nm with an efficiency of 31%. A full MLL is a complete linear MLL structure. It can be fabricated by bonding two partial MLL wafers, or by growing the full structure using magnetron sputtering without bonding. A 40-{mu}m full MLL, with a total of 5166 layers of WSi{sub 2} and Si, has been successfully grown by sputter deposition. The layer thicknesses gradually vary from 4 nm to {approx}400 nm and then back to 4 nm. Two coating runs were used to grow the full structure, one for each half. It took over 56 h for each run. A 100-{mu}m nearly-full MLL was constructed by bonding. Each 50-{mu}m half-structure has 1788 WSi{sub 2} and Si layers with 12-nm to {approx}32-nm thicknesses and {approx}32-{mu}m total thickness, followed by a thick WSi{sub 2} layer of {approx}17 {mu}m, and an AuSn layer of {approx}1 {mu}m. Both full MLL structures survived dicing and polishing. The primary results demonstrate the feasibility and potential of a full MLLmore » with a doubled numerical aperture and large beam acceptance for hard x-rays.« less

Authors:
; ; ; ; ; ;  [1];  [1];  [2]
  1. X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
  2. Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Publication Date:
OSTI Identifier:
21431074
Resource Type:
Journal Article
Journal Name:
AIP Conference Proceedings
Additional Journal Information:
Journal Volume: 1234; Journal Issue: 1; Conference: SRI 2009: 10. international conference on radiation instrumentation, Melbourne (Australia), 27 Sep - 2 Oct 2009; Other Information: DOI: 10.1063/1.3463245; (c) 2010 American Institute of Physics; Journal ID: ISSN 0094-243X
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; BEAM ACCEPTANCE; BONDING; DEPOSITION; DIFFRACTION; EFFICIENCY; HARD X RADIATION; KEV RANGE 10-100; LAUE METHOD; LAYERS; LENSES; MAGNETRONS; OPTICS; THICKNESS; TUNGSTEN SILICIDES; COHERENT SCATTERING; DIFFRACTION METHODS; DIMENSIONS; ELECTROMAGNETIC RADIATION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ENERGY RANGE; EQUIPMENT; FABRICATION; IONIZING RADIATIONS; JOINING; KEV RANGE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; RADIATIONS; REFRACTORY METAL COMPOUNDS; SCATTERING; SILICIDES; SILICON COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TUNGSTEN COMPOUNDS; X RADIATION

Citation Formats

Chian, Liu, Shi, B, Qian, J, Conley, R, Yan, H, Wieczorek, M, Macrander, A T, Maser, J, Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, Stephenson, G B, and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439. Full Multilayer Laue Lens for Focusing Hard X-rays. United States: N. p., 2010. Web. doi:10.1063/1.3463245.
Chian, Liu, Shi, B, Qian, J, Conley, R, Yan, H, Wieczorek, M, Macrander, A T, Maser, J, Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, Stephenson, G B, & Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439. Full Multilayer Laue Lens for Focusing Hard X-rays. United States. doi:10.1063/1.3463245.
Chian, Liu, Shi, B, Qian, J, Conley, R, Yan, H, Wieczorek, M, Macrander, A T, Maser, J, Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, Stephenson, G B, and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439. Wed . "Full Multilayer Laue Lens for Focusing Hard X-rays". United States. doi:10.1063/1.3463245.
@article{osti_21431074,
title = {Full Multilayer Laue Lens for Focusing Hard X-rays},
author = {Chian, Liu and Shi, B and Qian, J and Conley, R and Yan, H and Wieczorek, M and Macrander, A T and Maser, J and Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439 and Stephenson, G B and Materials Science Division, Argonne National Laboratory, Argonne, Illinois 60439},
abstractNote = {Multilayer Laue Lenses (MLLs) were developed by us using dynamic diffraction effects to efficiently focus hard x-rays to very small spots. Using a partial MLL we were able to focus 19.5-keV hard x-rays to a line focus of 16 nm with an efficiency of 31%. A full MLL is a complete linear MLL structure. It can be fabricated by bonding two partial MLL wafers, or by growing the full structure using magnetron sputtering without bonding. A 40-{mu}m full MLL, with a total of 5166 layers of WSi{sub 2} and Si, has been successfully grown by sputter deposition. The layer thicknesses gradually vary from 4 nm to {approx}400 nm and then back to 4 nm. Two coating runs were used to grow the full structure, one for each half. It took over 56 h for each run. A 100-{mu}m nearly-full MLL was constructed by bonding. Each 50-{mu}m half-structure has 1788 WSi{sub 2} and Si layers with 12-nm to {approx}32-nm thicknesses and {approx}32-{mu}m total thickness, followed by a thick WSi{sub 2} layer of {approx}17 {mu}m, and an AuSn layer of {approx}1 {mu}m. Both full MLL structures survived dicing and polishing. The primary results demonstrate the feasibility and potential of a full MLL with a doubled numerical aperture and large beam acceptance for hard x-rays.},
doi = {10.1063/1.3463245},
journal = {AIP Conference Proceedings},
issn = {0094-243X},
number = 1,
volume = 1234,
place = {United States},
year = {2010},
month = {6}
}