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Title: VNb{sub 9}O{sub 25-{delta}}-Synthesis, electrical conducting behaviour and density functional theory (DFT) calculation

Journal Article · · Journal of Solid State Chemistry
;  [1];  [2];  [1]
  1. Fachrichtung Chemie und Lebensmittelchemie, Technische Universitaet Dresden, Helmholtz Str. 10, D-01069 Dresden (Germany)
  2. Max-Planck-Institut fuer Chemische Physik fester Stoffe, Noethnitzer Str. 40, D-01187 Dresden (Germany)

In order to investigate the influence of the oxygen partial pressure (p(O{sub 2})) on the electrical conductivity, VNb{sub 9}O{sub 25} was prepared by thermal decomposition of freeze-dried oxalate precursors and by a solid state reaction of V{sub 2}O{sub 5}/Nb{sub 2}O{sub 5} mixtures. The samples were characterised by X-ray diffraction, grain size analysis and scanning electron microscopy (SEM). The electrical conductivity of the n-type semiconductor VNb{sub 9}O{sub 25-{delta}} can be interpreted as an activated hopping process with a preferred localisation of charge carriers at V(IV) centres. The electronic structure of VNb{sub 9}O{sub 25-{delta}} was calculated within the framework of the local density approximation (LDA) to DFT. Partial reduction of V(V) centres causes localised vanadium states to appear inside the band gap. The calculated activation energy values are in good agreement with the experimental ones. - Graphical Abstract: The electrical conductivity of the n-type semiconductor VNb{sub 9}O{sub 25-{delta}} can be interpreted as an activated hopping process with a preferred localisation of charge carriers at V(IV) centres. The electronic structure of VNb{sub 9}O{sub 25-{delta}} was calculated within the framework of the local density approximation (LDA) to DFT. The partial reduction of V(V) centres causes localised vanadium states to appear inside the band gap.

OSTI ID:
21370520
Journal Information:
Journal of Solid State Chemistry, Vol. 182, Issue 8; Other Information: DOI: 10.1016/j.jssc.2009.05.015; PII: S0022-4596(09)00204-7; Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.; ISSN 0022-4596
Country of Publication:
United States
Language:
English