Development of atomic radical monitoring probe and its application to spatial distribution measurements of H and O atomic radical densities in radical-based plasma processing

Journal Article · Tue Sep 01 00:00:00 EDT 2009 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3212990· OSTI ID:21361798

Takahashi, Shunji ^[1]; Takashima, Seigo ^[2]; Yamakawa, Koji; Den, Shoji ^[3]; Kano, Hiroyuki ^[4]; Takeda, Keigo ^[1]; Hori, Masaru ^[1]

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1. Department of Electrical Engineering and Computer Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603 (Japan)
2. Plasma Center for Industrial Applications, Nagoya Urban Industries Promotion Corporation, 2268-1 Anagahora, Shimoshidami, Moriyama-ku, Nagoya 463-0003 (Japan)
3. Katagiri Engineering Co., Ltd., 3-5-34 Shitte Tsurumi-ku, Yokohama 230-0003 (Japan)
4. NU-EcoEngineering Co., Ltd., 1237-87 Aza Umazutsumi, Ooaza Kurozasa, Miyoshi-cho, Nishikamo-gun, Aichi 470-0201 (Japan)

Atomic radicals such as hydrogen (H) and oxygen (O) play important roles in process plasmas. In a previous study, we developed a system for measuring the absolute density of H, O, nitrogen, and carbon atoms in plasmas using vacuum ultraviolet absorption spectroscopy (VUVAS) with a compact light source using an atmospheric pressure microplasma [microdischarge hollow cathode lamp (MHCL)]. In this study, we developed a monitoring probe for atomic radicals employing the VUVAS with the MHCL. The probe size was 2.7 mm in diameter. Using this probe, only a single port needs to be accessed for radical density measurements. We successfully measured the spatial distribution of the absolute densities of H and O atomic radicals in a radical-based plasma processing system by moving the probe along the radial direction of the chamber. This probe allows convenient analysis of atomic radical densities to be carried out for any type of process plasma at any time. We refer to this probe as a ubiquitous monitoring probe for atomic radicals.

• OSTI ID: 21361798
• Journal Information: Journal of Applied Physics, Vol. 106, Issue 5; Other Information: DOI: 10.1063/1.3212990; (c) 2009 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

74 ATOMIC AND MOLECULAR PHYSICS
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABSORPTION SPECTROSCOPY
ATMOSPHERIC PRESSURE
CARBON
HOLLOW CATHODES
HYDROGEN
LIGHT BULBS
LIGHT SOURCES
NITROGEN
OXYGEN
PLASMA
PLASMA DENSITY
PLASMA PRESSURE
RADICALS
SPATIAL DISTRIBUTION
ULTRAVIOLET RADIATION
ULTRAVIOLET SPECTRA
CATHODES
DISTRIBUTION
ELECTRODES
ELECTROMAGNETIC RADIATION
ELEMENTS
NONMETALS
RADIATION SOURCES
RADIATIONS
SPECTRA
SPECTROSCOPY