Photoluminescence study on heavily donor and acceptor impurity doped GaAs layers grown by molecular-beam epitaxy
- School of Materials Science, Japan Advanced Institute of Science and Technology, Asahidai 1-1, Nomishi, Ishikawa 923-1292 (Japan)
Gallium arsenide layers doped with high concentrations of Be and Si by molecular-beam epitaxy are studied by photoluminescence (PL) spectroscopy. PL peaks from doped layers are observed at energies significantly lower than the band-gap of GaAs. The growth and doping conditions suggest that the origin of these peaks is different from that of low energy PL peaks, which were observed in earlier studies and attributed to impurity-vacancy complexes. The dependence of the peak energy on the temperature and the annealing is found to differ from that of the peaks attributed to impurity-vacancy complexes. On the basis of these observations, it is suggested that the low energy peaks are attributed to short range ordered arrangements of impurity ions. This possibility is examined by calculations of the PL spectra with models of pairs of acceptor and donor delta-doped layers and PL experiments of a superlattice of pairs of Be and Si delta-doped layers.
- OSTI ID:
- 21356136
- Journal Information:
- Journal of Applied Physics, Vol. 105, Issue 9; Other Information: DOI: 10.1063/1.3122522; (c) 2009 American Institute of Physics; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ANNEALING
BERYLLIUM
CRYSTAL GROWTH
DOPED MATERIALS
GALLIUM ARSENIDES
IMPURITIES
LAYERS
MOLECULAR BEAM EPITAXY
PHOTOLUMINESCENCE
SEMICONDUCTOR MATERIALS
SILICON
SPECTROSCOPY
SUPERLATTICES
THIN FILMS
VACANCIES
ALKALINE EARTH METALS
ARSENIC COMPOUNDS
ARSENIDES
CRYSTAL DEFECTS
CRYSTAL GROWTH METHODS
CRYSTAL STRUCTURE
ELEMENTS
EMISSION
EPITAXY
FILMS
GALLIUM COMPOUNDS
HEAT TREATMENTS
LUMINESCENCE
MATERIALS
METALS
PHOTON EMISSION
PNICTIDES
POINT DEFECTS
SEMIMETALS