GaN-based light-emitting diode with textured indium tin oxide transparent layer coated with Al{sub 2}O{sub 3} powder
- Department of Semiconductor and Chemical Engineering and Semiconductor Physics Research Center, Chonbuk National University, Jeonju 561-756 (Korea, Republic of)
- Optowell Co., Ltd., 308, Semiconductor Physics Research Center, 664-14, Dukjin-Dong, Dukjin-Gu, Jeonju 561-756 (Korea, Republic of)
Surface-textured InGaN/GaN light-emitting diodes (LEDs) coated with transparent Al{sub 2}O{sub 3} powder were fabricated by natural lithography combined with inductively coupled plasma etching. For surface texturing, 300 nm size Al{sub 2}O{sub 3} powder is used as an etching mask by simply coating the surface using a spin-coating process. Also, the powders are left on the surface after surface texturing to further increase extraction efficiency. At 20 mA, the light output power of the textured indium tin oxide (ITO) InGaN/GaN LEDs coated with the Al{sub 2}O{sub 3} powder is enhanced by {approx}112% compared with the conventional nontextured ITO LED. The enhanced light output power is attributed to the improved extraction efficiency resulting from an overall decrease in the total internal reflection due to the textured surface and the Al{sub 2}O{sub 3} powder coating.
- OSTI ID:
- 21294043
- Journal Information:
- Applied Physics Letters, Vol. 94, Issue 16; Other Information: DOI: 10.1063/1.3120222; (c) 2009 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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