Characterization of carbon nitride deposition from CH{sub 4}/N{sub 2} glow discharge plasma beams using optical emission spectroscopy
- State Key Laboratory for Advanced Photonics and Devices, Department of Optical Science and Engineering, Fudan University, Shanghai 200433 (China)
The properties of plasmas in a CH{sub 4}/N{sub 2} dc abnormal glow discharge with the percentage of methane from 1% to 20% have been studied in order to understand the effect of precursor incorporation into the carbon nitride (CN{sub x}) films. The appearance of CN radicals as well as C{sub 2}, CH, and NH has been revealed by optical emission spectroscopy (OES). The evolution of CN, N{sub 2}, N{sub 2}{sup +}, and C{sub 2} emission lines from mixed CH{sub 4}/N{sub 2} and pure N{sub 2} plasma on changing mixture ratio and polarity of discharge-field has been studied. The possible mechanisms behind their variations have been discussed. Besides, a CH{sub 4}/N{sub 2} ratio of 1/50 and a top-needle anode is considered to be the best conditions for synthesis of {beta}-C{sub 3}N{sub 4}, which has been confirmed in the as-deposited carbon nitride films with quite good crystalline features by XRD analyses.
- OSTI ID:
- 21268998
- Journal Information:
- Physics of Plasmas, Vol. 15, Issue 7; Other Information: DOI: 10.1063/1.2953521; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
- Country of Publication:
- United States
- Language:
- English
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